1
Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Williamson David M, HASEGAWA Yoshiki, March 4, 2004: WO/2004/019128 (891 worldwide citation)

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


2
Williamson David M: High numerical aperture ring field optical reduction system. Svg Lithography Systems, June 18, 1997: EP0779528-A2 (100 worldwide citation)

An optical projection reduction system used in photolithography for the manufacture of semiconductor devices having a first mirror pair (M1, M2; M1', M2'; M1'', M2''), a second field mirror pair (M3, M4; M3', M4'; M3'', M4''), and a third mirror pair (M5, M6; M5', M6'; M5'', M6''). Electromagnetic r ...


3
Williamson David M: Optical reduction system.. Perkin Elmer, January 17, 1990: EP0350955-A2 (12 worldwide citation)

An unobscured catadioptric optical reduction system wherein all refractive elements are made of the same material. From its long conjugate end to its short conjugate end the system comprises a first lens group (12,13), a beamsplitter (17), a second lens group (14,15), a mirror and a third lens group ...


4
Williamson David M: Four mirror euv projection optics. Svg Lithography Systems, March 24, 1999: EP0903605-A2 (6 worldwide citation)

An all reflective ring field projection optic system for use in scanning photolithography used in the manufacture of semiconductor wafers. The projection optics are designed for wavelengths in the extreme ultraviolet ranging from 11 to 13 nm to provide an arcuate image field for a reduction step and ...


5
Galburt Daniel N, Williamson David M: On-axis mask and wafer alignment system. Svg Lithography Systems, July 30, 1997: EP0786071-A1 (3 worldwide citation)

PCT No. PCT/US94/11506 Sec. 371 Date Feb. 14, 1997 Sec. 102(e) Date Feb. 14, 1997 PCT Filed Oct. 11, 1994 PCT Pub. No. WO96/11376 PCT Pub. Date Apr. 18, 1996An on-axis through the lens optical alignment system for use in semiconductor manufacturing using step and scan photolithographic techniques. A ...


6
Williamson David M: High numerical aperture catadioptric lens. Svg Lithography Systems, January 23, 2002: EP1174749-A2 (1 worldwide citation)

A catadioptric projection optical system for use in photolithography used in manufacturing semiconductors having a quarter waveplate (12) following a reticle (10) and multiple aspheric surfaces and calcium fluoride lens elements. A quarter waveplate (12) following the reticle (10) eliminates asymmet ...


7
Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nippon Kogaku, May 25, 2005: EP1532489-A2

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


8
Williamson David M: An optical reduction system for use in photolithography. Asml Holding, March 26, 2008: EP1903370-A1

A catadioptric projection optical system for use in photolithography used in manufacturing semiconductors. The present invention provides a projection optics system having a numerical aperture of 0.75 for use with wavelengths in the 248, 193, and 157 nanometer range. The object and image locations a ...


9
Williamson David M: Systeme de reduction optique, Optical reduction system. Svg Lithography Systems, OSLER HOSKIN & HARCOURT, July 20, 1993: CA1320375

MI-3826 ABSTRACT OF THE INVENTION An unobscured catadioptric optical reduction systemwherein all refractive elements are made of the samematerial. From its long conjugate end to its short conjugateend the system comprises a first lens group, a beamsplitter,a second lens group, a mirror and a third l ...


10
Galburt Daniel N, Williamson David M: On-axis mask and wafer alignment system. Svg Lithography Systems, Galburt Daniel N, Williamson David M, FATTIBENE Paul A, April 18, 1996: WO/1996/011376

An on-axis through the lens optical alignment system for use in semiconductor manufacturing using step and scan photolithographic techniques. An optical alignment system uses a partially common path with the projection optics (16) optical axis (38) in order to detect alignment targets on a wafer (10 ...