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Erwin Meinders
Martijn Henri Richard Lankhorst, Franciscus Petrus Widdershoven, Robertus Adrianus Maria Wolters, Wilhelmus Sebastianus Marcus Maria Ketelaars, Erwin Rinaldo Meinders: Electric device with phase change material and method of manufacturing the same. Koninklijke Phillips Electronics, Peter Zawilski, October 10, 2006: US07119353 (15 worldwide citation)

The electric device (100) has a body (102) having a resistor (107) comprising a phase change material being changeable between a first phase and a second phase. The resistor (107) has a first electrical resistance when the phase change material is in the first phase, and a second electrical resistan ...


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Wilhelmus Sebastianus Marcus Maria Ketelaars, Arjen Boogaard: Digital camera with panorama or mosaic functionality. Koninklijke Philips Electronics, June 29, 2010: US07746375 (8 worldwide citation)

A digital camera has a memory and a scan-mode. In this mode, the camera takes a sequence of still pictures. A next one of the pictures in the sequence is selected for being stored in the memory based on an amount of overlap regarding a picture content with a previous one of the pictures stored in th ...


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Arjen Boogaard, Timotheus Franciscus Sengers, Wilhelmus Sebastianus Marcus Maria Ketelaars, Carolus Ida Maria Antonius Spee: Exposure apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 9, 2014: US08830446

An extreme ultraviolet exposure apparatus includes a radiation system configured to supply a beam of extreme ultraviolet radiation; a support configured to support a patterning device, the patterning device configured to pattern the beam of extreme ultraviolet radiation according to a desired patter ...


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Arjen Boogaard, Timotheus Franciscus Sengers, Wilhelmus Sebastianus Marcus Maria Ketelaars, Carolus Ida Maria Antonius Spee: Exposure apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 24, 2013: US08542341

An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a pr ...


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Aurelie Marie Andree Brizard, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Henri Marie Joseph Boots, Thanh Trung Nguyen: Self-assemblable polymer and method for use in lithography. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, March 15, 2016: US09285676

A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of ...


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Emiel Peeters, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Thanh Trung Nguyen, Oktay Yildirim: Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, January 12, 2016: US09235125

A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition includi ...


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Wilhelmus Sebastianus Marcus Maria Ketelaars, Arjen Boogaard: Digital camera with panorama or mosaic functionality. Koninklijke Philips Electronics, Philips Intellectual Property & Standards, April 19, 2007: US20070085913-A1

A digital camera has a memory and a scan-mode. In this mode, the camera takes a sequence of still pictures. A next one of the pictures in the sequence is selected for being stored in the memory based on an amount of overlap regarding a picture content with a previous one of the pictures stored in th ...


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Falco Cornelius Marinus Jacobus Maria Van Delft, Wilhelmus Sebastianus Marcus Maria Ketelaars, Mark Kroon: Method of forming a pattern of sub-micron broad features. Michael E Marion, c o US PHILIPS CORPORATION, August 14, 2003: US20030150737-A1

A pattern of very fine features (18) can be produced by illuminating an inorganic negative tone resist layer (16), provided on an electroplating base layer (14), by a beam (EB), which is able to cure the resist to a cured pattern according to the pattern to be formed, removing the non-illuminated po ...


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