1
Wayne L Johnson: Plasma generating apparatus employing capacitive shielding and process for using such apparatus. Michael Y Epstein, August 10, 1993: US05234529 (160 worldwide citation)

A plasma generating apparatus includes a plasma containing region and an R.F. coil for generating R.F. electric fields within the plasma region for creating a plasma from a gas flowed through the region. A capacitive shield is disposed between the coil and the plasma region for limiting the amount o ...


2
Wayne L Johnson, Eric J Strang: Multi-zone resistance heater. Tokyo Electron, Oblon Spivak McClelland Maier & Neustadt P C, May 25, 2004: US06740853 (146 worldwide citation)

A substrate holder for holding a substrate (e.g., a wafer or an LCD panel) during plasma processing. The substrate holder is a stack of processing elements which each perform at least one function. The elements include an electrostatic chuck (


3
Wayne L Johnson, Eric J Strang: Pulsed plasma processing method and apparatus. Tokyo Electron, Pillsbury Winthrop Shaw Pittman, January 23, 2007: US07166233 (133 worldwide citation)

In a method for performing a plasma-assisted treatment on a substrate in a reactor chamber by: introducing at least one process gas into the reactor chamber; and creating a plasma within the reactor chamber by establishing an RF electromagnetic field within the chamber and allowing the field to inte ...


4
Daniel L Flamm, Dale E Ibbotson, Wayne L Johnson: Processes depending on plasma generation using a helical resonator. American Telephone and Telegraph Company AT&T Bell Laboratories, Bruce S Schneider, April 17, 1990: US04918031 (130 worldwide citation)

Anisotropic plasma etching is accomplished utilizing a helical resonator operated at relatively low gas pressure. The use of this combination yields an extremely high flux of ionic species with resulting rapid anisotropic etching. A helical resonator in conjunction with suitable precursors is also q ...


5
Wayne L Johnson, Richard Parsons: Electrical impedance matching system and method. Tokyo Electron, Oblon Spivak McClelland Maier & Neustadt P C, November 6, 2001: US06313584 (89 worldwide citation)

A system and method for processing substrates having an improved matching system. A matching controller (


6
McDonald Robinson, Ronald D Behee, Wiebe B deBoer, Wayne L Johnson: Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus. Epsilon Partnership, David G Rosenbaum, Harry M Weiss, December 6, 1988: US04789771 (66 worldwide citation)

An apparatus and method for heating a substrate and associated rotatable susceptor in an epitaxial deposition reactor with an axially symmetric gas flow carrying deposition material include at least one chamber having a plurality of heat lamps. The chamber is generally symmetric with respect to an a ...


7
Wiebe B deBoer, Klavs F Jensen, Wayne L Johnson, Gary W Read, McDonald Robinson: Apparatus for chemical vapor deposition using an axially symmetric gas flow. Epsilon, David G Rosenbaum, Harry M Weiss, January 17, 1989: US04798165 (60 worldwide citation)

In a chemical vapor deposition chamber, an improved technique for providing deposition materials to the growth surface is described. The gas carrying deposition materials is constrained to have axial symmetry thereby providing a uniform deposition of materials on the substrate. The gas can be initia ...


8
Wayne L Johnson, Richard Parsons: Device and method for detecting and preventing arcing in RF plasma systems. Tokyo Electron, Oblon Spivak McClelland Maier & Neustadt P C, December 25, 2001: US06332961 (54 worldwide citation)

A system and method for detecting and preventing arcing in plasma processing systems. Arcing is detected and characterized by measuring and analyzing electrical signals from a circuit coupled to the plasma. After characterization, the electrical signals can then be correlated with arcing events occu ...


9
Eric J Makus, Robert L Usibelli, Sean M Usibelli, Edwin Thorne III, Wayne L Johnson: Displaying hierarchial relationship of data accessed via subject index. Town Compass, Ronald M Anderson, June 29, 2004: US06757673 (51 worldwide citation)

A data viewer for displaying information selected from hierarchically organized data enables hierarchical searching by displaying hierarchical levels, or alternatively, by implementing an index search of selected data elements. If the index search is selected, an alphabetically ordered list of selec ...


10
Eric J Strang, Wayne L Johnson: Apparatus for active temperature control of susceptors. Tokyo Electron, Oblon Spivak McClelland Maier & Neustadt P C, December 25, 2007: US07311782 (35 worldwide citation)

A method and an apparatus utilized for thermal processing of substrates during semiconductor manufacturing. The method includes heating the substrate to a predetermined temperature using a heating assembly, cooling the substrate to the predetermined temperature using a cooling assembly located such ...