1
W Thomas Novak, Zahirudeen Premji, Uday G Nayak, Akimitsu Ebihara: Precision motion stage with single guide beam and follower stage. Nikon Precision, Norman R Klivans, Skjerven Morrill MacPherson Franklin & Friel, April 29, 1997: US05623853 (414 worldwide citation)

An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in ...


2
W Thomas Novak: Lithography system. Micronix Partners, Thomas S MacDonald, Alan H MacPherson, Richard Franklin, April 30, 1985: US04514858 (82 worldwide citation)

A lithography system for X-ray or other beam printing on a substrate such as a silicon semiconductor wafer comprises a beam chamber (301), a beam source (302), means (309) for mounting a mask, means (308) for mounting an image sensing means (342) interiorly of the chamber, means (317, 318), for moun ...


3
W Thomas Novak: Lithography system. Micronix Partners, Thomas S MacDonald, Alan H MacPherson, Richard Franklin, May 7, 1985: US04516253 (78 worldwide citation)

A lithography system for X-ray or other beam printing on a substrate such as a silicon semiconductor wafer comprises a beam chamber (301), a beam source (302), means (309) for mounting a mask, means (308) for mounting an image sensing means (342) interiorly of the chamber, means (317, 318), for moun ...


4
Vladimir E Leibovich, W Thomas Novak: Coarse and fine motion positioning mechanism. Micronix Corporation, Thomas S MacDonald, Alan H MacPherson, Paul J Winters, February 2, 1988: US04723086 (59 worldwide citation)

The positioning system, particularly useful for moving a stage mounting a semiconductor wafer for the manufacture of semiconductor devices, provides a lead screw and zero backlash nut for coarse motion of the stage. A thrust member fixedly mounts the nut and the member is flexurally mounted to a hou ...


5
Bernard Fay, W Thomas Novak: Multiple wavelength linear zone plate alignment apparatus and method. Micronix Corporation, Thomas S MacDonald, Alan H MacPherson, Paul J Winters, November 3, 1987: US04704033 (59 worldwide citation)

An optical alignment apparatus and method for a semiconductor lithography mask and wafer utilizes two monochromatic light sources of different wavelengths. The mask contains targets in the form of linear Fresnel zone plates and the wafer contains a reflecting grating. Incident illumination from the ...


6
W Thomas Novak: Dual guide beam stage mechanism with yaw control. Nikon Precision, Norman R Klivans, Skjerven Morrill Macpherson Franlin & Friel, June 2, 1998: US05760564 (48 worldwide citation)

A dual guide beam stage mechanism for accurate X-Y positioning for use e.g. in semiconductor processing equipment provides accurate planar motion and yaw control. Over-constraint between components in their relative motion is minimized by utilizing flexibly mounted air bearings at the connection bet ...


7
W Thomas Novak, Andrew J Hazelton, Douglas C Watson: Environmental system including a transport region for an immersion lithography apparatus. Nikon Corporation, Oliff & Berridge, July 31, 2007: US07251017 (45 worldwide citation)

An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier, an immersion fluid system, and a transport region. The fluid barrier is positioned near the device and maintains the transport region near the gap. The immersion fluid syst ...


8
Andrew J Hazelton, Hidemi Kawai, Douglas C Watson, W Thomas Novak: Cleanup method for optics in immersion lithography. Nikon Corporation, Oliff & Berridge, April 21, 2009: US07522259 (43 worldwide citation)

An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation ...


9
Andrew J Hazelton, W Thomas Novak, Akimitsu Ebihara: Wafer positioner with planar motor and mag-lev fine stage. Nikon Corporation, Steven G Roeder, Jim Rose Esq, August 20, 2002: US06437463 (39 worldwide citation)

A positioning stage assembly having a coarse stage which includes a planar motor driveable in at least two degrees of freedom, and a fine stage positioned on the coarse stage which is driveable in at least three degrees of freedom with respect to the coarse stage. More preferably, the fine stage is ...


10
W Thomas Novak: Electro-magnetic motor cooling system. Nikon Corporation, Thomas S MacDonald, Debra A Chun, December 7, 1999: US05998889 (35 worldwide citation)

A lithographic system includes a chamber housing a stage mechanism and a linear motor coil that drives the stage mechanism. The linear motor includes a coil having two sidewalls, the coil being movable along a magnet track generating a magnetic field. A pair of jacket walls are attached to respectiv ...