1
Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital&apos evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, September 2, 2003: US06614505 (39 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...


2
Konstantin Nikolaevitch Koshelev, Frederik Bijkerk, Givi Georgievitch Zukavishvili, Evgenii Dmitreevitch Korop, Vladimir Vital&apos evitch Ivanov: Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, November 16, 2004: US06818912 (4 worldwide citation)

A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an a ...


3
Konstantin Nikolaevitch Koshelev, Frederik Bijkerk, Givi Georgievitch Zukavishvili, Evgenii Dmitreevitch Korop, Vladimir Vital&apos evitch Ivanov: Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, December 23, 2003: US06667484 (3 worldwide citation)

A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an a ...