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Erwin Meinders
De Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Van Der Heijden Marcus Theodoor Wilhelmus, Meinders Erwin Rinaldo, Peter Maria: Lithographic apparatus and method. Asml Netherlands, Tno, de Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Van Der Heijden Marcus Theodoor Wilhelmus, Meinders Erwin Rinaldo, Peter Maria, ROBERTS Peter David, May 14, 2009: WO/2009/060294 (1 worldwide citation)

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including: directing a beam of radiation at the surface of the flexible substrate; and detecting changes in the intensity distribution of the beam of radiation after the beam of radiation ...


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De Jong Anthonius Martinus Cornelis Petrus, Bouchoms Igor Petrus Maria, Bruls Richard Joseph, Jansen Hans, Antonius Leenders Martinus Hendrikus, Wanten Peter Franciscus, Van Der Heijden Marcus Theodoor Wilhelmus, Van Der Donck Jacques Cor Johan, Van Den Bogaard Frederick Johannes, Groenewold Jan, Van Der Graaf Sandra, Zoldesi Carmen Julia: Substrate and method to use substrate. Asml Netherlands, January 22, 2009: JP2009-016838 (1 worldwide citation)

PROBLEM TO BE SOLVED: To provide a method for removing contamination from a device used for lithography as an immersion liquid may be contaminated by resist separated from a substrate or the layer deposited on the substrate or particles or flakes of other materials and such contamination, and can ma ...


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Van Der Heijden Marcus Theodoor Wilhelmus, Kramer Ronald Harm Gunther, Van Den Bogaard Frederick Johannes, Janssen Peter Gerardus Hubertus Maria: Immersion lithography apparatus. Asml Netherlands, May 21, 2009: JP2009-111383

PROBLEM TO BE SOLVED: To provide a sampler, a sample holder and an immersion lithographic apparatus including the sampler.SOLUTION: The sampler 90 is provided to collect particles in an immersion system of a lithographic apparatus. The sampler 90 comprises a holder base 94 having a collector surface ...


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Van Der Heijden Marcus Theodoor Wilhelmus, Stavenga Marco Koert, Wong Patrick, Van Den Bogaard Frederick Johannes, de Vries Dirk, Bessems David, Mycke Jacques Roger Alice: Method of preparing substrate for lithography, substrate, device manufacturing method, sealing coating applicator, and sealing coating measuring device. Asml Netherlands, May 28, 2009: JP2009-117832

PROBLEM TO BE SOLVED: To provide a substrate for reducing a contamination source to be used for a lithography projection device.SOLUTION: The substrate W comprises a sealing coating 106 covering at least part of a first interface between two layers 100, 102 on the substrate or between each layer and ...


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De Jong Anthonius Martinus Cornelis Petrus, Bouchoms Igor Petrus Maria, Bruls Richard Joseph, Jansen Hans, Leenders Martinus Hendrikus Antonius, Wanten Peter Franciscus, Van Der Heijden Marcus Theodoor Wilhelmus, Van Der Donck Jacques Cor Johan, Van Den Bogaard Frederik Johannes, Groenewold Jan, Van Der Graaf Sandra, Zoldesi Carmen Julia: Method for removing contaminant from the apparatus used in the lithography. Asml Netherlands, January 14, 2009: KR1020080066024

PURPOSE: The substrate having the rigid support layer and the transformable layer provided on the rigid support layer is provided to prevent the pollution from the lithography apparatus. CONSTITUTION: The brush (brushes) layer(2) is formed in the substrate(1). The fibers of the brush layer do not ne ...


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