1
Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Theodorus Marinus Modderman, Marcel Mathijs Theodore Marie Dierichs: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 8, 2008: US07317504 (65 worldwide citation)

A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases ...


2
Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans, Vadim Yevgenyevich Banine: Lithographic projection apparatus and particle barrier for use therein. ASML Netherlands, Pillsbury Winthrop, January 4, 2005: US06838684 (44 worldwide citation)

A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to t ...


3
Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen: Radical cleaning arrangement for a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 9, 2008: US07462850 (42 worldwide citation)

A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at par ...


4
Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital&apos evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, September 2, 2003: US06614505 (39 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...


5
Lucas Henricus Johannes Stevens, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn: Lithographic apparatus having a monitoring device for detecting contamination. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 29, 2008: US07405417 (38 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy e ...


6
Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Cornelis Petrus Andreas Maria Luijkx, Frank Jeroen Pieter Schuurmans: Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 11, 2007: US07307263 (35 worldwide citation)

A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patter ...


7
Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 23, 2010: US07684008 (33 worldwide citation)

A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or ...


8
Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans, Vadim Yevgenyevich Banine: Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 6, 2006: US07057190 (27 worldwide citation)

A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse tra ...


9
Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Ralph Kurt, Frank Jeroen Pieter Schuurmans, Yurii Victorovitch Sidelnikov: Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 25, 2006: US07034308 (19 worldwide citation)

A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the ...


10
Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders: Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, August 24, 2004: US06781673 (17 worldwide citation)

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather t ...