1
Andrew T Hunt, Tzyy Jiuan Hwang, Helmut G Hornis, Wen Yi Lin: Formation of thin film capacitors. MicroCoating Technologies, March 27, 2001: US06207522 (79 worldwide citation)

Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, ...


2
Andrew T Hunt, Wen Yi Lin, Tzyy Jiuan Hwang, Michelle Hendrick, Helmut G Hornis: Formation of thin film capacitors. MicroCoating Technologies, Wayne E Nacker, Alfred H Muratori, S Matthew Cairns, August 13, 2002: US06433993 (61 worldwide citation)

Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, ...


3
Andrew T Hunt, Tzyy Jiuan Hwang, Helmut G Hornis, Wen Yi Lin: Formation of thin film capacitors. Shipley Company L L C, S Matthew Cairns, April 27, 2004: US06728092 (49 worldwide citation)

Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, ...


4
Andrew Tye Hunt, Tzyy Jiuan Hwang, Hong Shao: Combustion chemical vapor deposition of phosphate films and coatings. Georgia Tech Research Corporation, Jones & Askew, January 12, 1999: US05858465 (33 worldwide citation)

A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at lea ...


5
Andrew T Hunt, Tzyy Jiuan Hwang, Helmut G Hornis, Hong Shao, Joe Thomas, Wen Yi Lin, Shara S Shoup, Henry A Luten, John Eric McEntyre: Precursor solution compositions for electronic devices using CCVD. Morton International Incorporated, February 27, 2001: US06193911 (20 worldwide citation)

Precursor solutions are provided to produce thin film resistive materials by combustion chemical vapor deposition (CCVD) or controlled atmosphere combustion chemical vapor deposition (CACCVD). The resistive material may be a mixture of a zero valence metal and a dielectric material, or the resistive ...


6
Andrew T Hunt, Wen Yi Lin, Shara S Shoup, Richard W Carpenter, Stephen E Bottomley, Tzyy Jiuan Hwang, Michelle Hendrick: Formation of thin film resistors. Microcoating Technologies, Wayne E Nacker, Alfred H Muratori, Darryl P Frickey, December 11, 2001: US06329899 (19 worldwide citation)

A method is provided for forming a patterned layer of resistive material in electrical contact with a layer of electrically conducting material. A three-layer structure is formed which comprises a metal conductive layer, an intermediate layer formed of material which is degradable by a chemical etch ...


7
Andrew T Hunt, Wen Yi Lin, Shara S Shoup, Richard W Carpenter, Stephen E Bottomley, Tzyy Jiuan Hwang, Michelle Hendrick: Formation of thin film resistors. Morton International, Al Muratori, Wayne E Nacker, S Matthew Cairns, December 31, 2002: US06500350 (16 worldwide citation)

A method is provided for forming a patterned layer of resistive material in electrical contact with a layer of electrically conducting material. A three-layer structure is formed which comprises a metal conductive layer, an intermediate layer formed of material which is degradable by a chemical etch ...


8
K J Lee, Joe K Cochran Jr, Tzyy Jiuan Hwang: Advanced radiant gas burner and method utilizing flame support rod structure. Gas Research Institute, Thomas Kayden Horstemeyer & Risley, June 24, 1997: US05641282 (14 worldwide citation)

A high intensity and high efficiency radiant gas burner (10) has a housing (8), a gas inlet (11) for receiving a combustible gas, a gas injection plate (13) for distributing the gas, a gas distribution chamber (16) for permitting the gas to expand, a porous ceramic layer (17) for receiving the gas f ...


9
Andrew T Hunt, Subramaniam Shanmugham, William D Danielson, Henry A Luten, Tzyy Jiuan Hwang, Girish Deshpande: Apparatus and process for controlled atmosphere chemical vapor deposition. MicroCoating Technologies, Wayne E Nacker, Alfred H Muratori, Darryl P Frickey, April 9, 2002: US06368665 (8 worldwide citation)

An improved chemical vapor deposition apparatus and procedure is disclosed. The technique provides improved shielding of the reaction and deposition zones involved in providing CVD coatings, whereby coatings can be produced, at atmospheric pressure, of materials which are sensitive to components in ...


10
Andrew Tye Hunt, Tzyy Jiuan Hwang, Michelle R Hendrick, Hong Shao, Joseph R Thomas: Corrosion-resistant multilayer coatings. Wayne E Nacker, Alfred H Muratori, Peter G Pappas, April 10, 2001: US06214473 (7 worldwide citation)

A corrosion-resistant coating for a substrate is described. The corrosion-resistant coating comprises a first distinct layer of a first composition disposed over the substrate, wherein the first distinct layer has a thickness that is not greater than about 10 microns, and a second distinct layer of ...