1
Tsuneo Miyai, Yuji Imai, Tetsuo Taniguchi, Kousuke Suzuki: Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors. Nikon Corporation, Shapiro and Shapiro, December 3, 1996: US05581324 (93 worldwide citation)

A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive ...


2
Tsuneo Miyai, Yuji Imai: Exposure apparatus. Nikon Corporation, Oliff & Berridge, October 20, 1998: US05825470 (22 worldwide citation)

Disclosed is an exposure apparatus comprising a substrate holder washing unit and a substrate holder storing unit. While a substrate holder exported from an exposure stage is washed in the washing unit, a clean holder previously stored in the storing unit is transported to an X stage by using a robo ...


3
Yoshiki Kida, Tsuneo Miyai: Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, May 31, 2005: US06900880 (5 worldwide citation)

The exposure apparatus comprises a projection optical system that has an image field capable of exposing a shot area in a scanning exposure apparatus in one shot. This allows a 1 in 1 exposure, with the shot area being the maximum exposable range of the scanning exposure apparatus. In addition, the ...


4
Tsuneo Miyai, Yuji Imai: Projection exposure method and projection exposure apparatus. Nikon Corporation, Nixon & Vanderhye P C, August 10, 1999: US05936711 (5 worldwide citation)

A focusing operation is performed so that the center of an exposure region on a photosensitive substrate coincides with a focal point of a projection optical system, based on setting information of a variable field stop, which sets the exposure region. Even in a case where only a portion of an expos ...


5
Yoshiki Kida, Tsuneo Miyai: Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method. Nikon Corporation, Oblon Spivak Mcclelland Maier & Neustadt PC, January 10, 2002: US20020003216-A1 (3 worldwide citation)

The exposure apparatus comprises a projection optical system that has an image field capable of exposing a shot area in a scanning exposure apparatus in one shot. This allows a 1 in 1 exposure, with the shot area being the maximum exposable range of the scanning exposure apparatus. In addition, the ...


6

7
Yoshiki Kida, Tsuneo Miyai: Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method. Nikon Corporation, Oblon Spivak Mcclelland Maier & Neustadt PC, February 26, 2004: US20040036849-A1

The exposure apparatus comprises a projection optical system that has an image field capable of exposing a shot area in a scanning exposure apparatus in one shot. This allows a 1 in 1 exposure, with the shot area being the maximum exposable range of the scanning exposure apparatus. In addition, the ...