1
Shigeru Komatsuzaki, Toshinobu Hirayama, Tetsuo Toyokawa: Wound dressing having a porous structure. Nippon Zeon, Armstrong Westerman Hattori McLeland & Naughton, March 29, 1994: US05298015 (513 worldwide citation)

A dressing for a wound having a porous structure of continuous pores throughout the dressing made of minute filaments arranged in three dimensions and filmy links (viewed at a magnification of about 35 to 350) connecting the filaments. The porous structure has pores defined by the filmy interconnect ...


2
Shigeru Komatsuzaki, Toshinobu Hirayama, Tetsuo Toyokawa: Method of manufacturing a wound dressing. Nippon Zeon, Armstrong Nikaido Marmelstein Kubovcik & Murray, September 22, 1992: US05149469 (6 worldwide citation)

A method of manufacturing a wound dressing having microscopic web-like interconnections and a porous structure of continuous pores throughout the wound dressing. In the first embodiment of the method, the dressing is produced by the steps of heating while simultaneously stirring a biocompatible mate ...


3
Toshinobu Hirayama, Toshiro Yamada, Tatsuya Sugimoto, Mitsuru Sugawara: Gas for plasma reaction and method for production thereof. Zeon Corporation, Armstrong Kratz Quintos Hanson & Brooks, April 26, 2005: US06884365 (5 worldwide citation)

A high-purity gas for plasma reaction having an octafluorocyclopentene purity of at least 99.9% by volume based on the total volume of the gas for plasma reaction, wherein the total content of nitrogen gas and oxygen gas, contained as trace gaseous ingredients of the remainder, is not larger than 20 ...


4
Toshinobu Hirayama, Toshiro Yamada, Tatsuya Sugimoto, Mitsuru Sugawara: Gas for plasma reaction and process for producing thereof. Zeon Corporation, Edwards Angell Palmer & Dodge, November 11, 2008: US07449415

A high-purity gas for plasma reaction having an octafluorocyclopentene purity of at least 99.9% by volume based on the total volume of the gas for plasma reaction, wherein the total content of nitrogen gas and oxygen gas, contained as trace gaseous ingredients of the remainder, is not larger than 20 ...


5
Toshinobu Hirayama, Toshiro Yamada, Tatsuya Sugimoto, Mitsuru Sugawara: Gas for plasma reaction and process for producing thereof. Zeon Corporation, Armstrong Kratz Quintos Hanson & Brooks, August 18, 2005: US20050178731-A1

A high-purity gas for plasma reaction having an octafluorocyclopentene purity of at least 99.9% by volume based on the total volume of the gas for plasma reaction, wherein the total content of nitrogen gas and oxygen gas, contained as trace gaseous ingredients of the remainder, is not larger than 20 ...