1
Torbjorn Sandstrom: Pattern generator using EUV. Micronic Laser Systems, Birch Stewart Kolasch & Birch, February 3, 2004: US06687041 (239 worldwide citation)

The present invention relates to an apparatus for creating a pattern with extremely high resolution on a workpiece, such as a pattern on a semiconductor chip. The apparatus comprises a source for emitting electromagnetic radiation in the EUV wavelength range, a spatial modulator (SLM) having a multi ...


2
Torbjorn Sandstrom: Pattern generator. Micronic Laser Systems, Harness Dickey, June 8, 2004: US06747783 (236 worldwide citation)

An apparatus is provided for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus includes a radiation source and a spatial modulator (SLM) having a multitude of modulating elements (pixels). It further includes an ele ...


3
Torbjorn Sandstrom, Lars Stiblert, Diana M Maul: Method and instrument for detection of change of thickness or refractive index for a thin film substrate. Biostar, Lyon & Lyon, May 20, 1997: US05631171 (134 worldwide citation)

An instrument configured and arranged to detect a change in thickness or refractive index of a thin film substrate. A method for optimizing the instrument and a method for detecting a change in thickness or refractive index of a thin film substrate.


4
Torbjorn Sandstrom: Pattern generator for avoiding stitching errors. Micronic Laser Systems, Birch Stewart Kolasch & Birch, September 4, 2001: US06285488 (130 worldwide citation)

The present invention relates to an apparatus for creating a pattern on a workpiece, such as a photomask, a semiconductor wafer, an electronic interconnect device, a printed circuit board, a display panel, a microoptical device or a printing plate, whereby a pattern with less visible edges is create ...


5
Torbjorn Sandstrom: Modulator design for pattern generator. Micronic Laser Systems, Birch Stewart Kolasch & Birch, January 7, 2003: US06504644 (61 worldwide citation)

An apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus includes a radiation source, a spatial modulator (SLM) having a multitude of modulating elements (pixels), a projection system, an electronic data p ...


6
Torbjorn Sandstrom, Lars Stiblert, Diana M Maul: Devices and methods for detection of an analyte based upon light interference. Biostar, Lyon & Lyon, February 27, 1996: US05494829 (60 worldwide citation)

Instrument configured and arranged to detect the presence or amount of an analyte of interest on the substrate of an optical device. The instrument has a source of linearly polarized, monochromatic light positioned at an angle other than Brewster's angle relative to the substrate; and an analyzer po ...


7
Torbjorn Sandstrom, Peter Ekberg, Per Askebjer, Mats Ekberg, Anders Thuren: Method for error reduction in lithography. Micronic Laser Systems, Harness Dickey & Pierce, April 19, 2005: US06883158 (58 worldwide citation)

The present invention relates to a method and a system for predicting and correcting geometrical errors in lithography using masks, such as large-area photomasks or reticles, and exposure stations, such as wafer steppers or projection aligners, printing the pattern of said masks on a workpiece, such ...


8
B Hakan Nygren, E Torbjorn Sandstrom, Johan E Stenberg, Lars B Stiblert: Method and member for detecting and/or measuring the concentration of a chemical substance. Sagax Instrument, Fleit Jacobson Cohn & Price, December 10, 1985: US04558012 (52 worldwide citation)

A member for detecting and/or measuring the level of concentration of a chemical substance in a medium comprises a non-metal substrate bearing a dielectric layer. A detection reactant which is capable of reacting with the substance to be detected is put on the dielectric layer and the assembly is pu ...


9
Torbjorn Sandstrom: Method for pattern generation with improved image quality. Micronic Laser Systems, Birch Stewart Kolasch & Birch, August 6, 2002: US06428940 (39 worldwide citation)

The present invention relates to a method for creating a microlithographic pattern on a workpiece, for increased resolution and image fidelity. The method comprises the steps of: providing a source for emitting electromagnetic radiation, illuminating by said radiation a spatial light modulator (SLM) ...


10
Torbjorn Sandstrom, Anders Thurèn: Data path for high performance pattern generator. Micronic Laser Systems, Birch Stewart Kolasch & Birch, April 6, 2004: US06717097 (33 worldwide citation)

A high-speed datapath for a high-performance pattern generator such as an analog SLM for generating the image is disclosed. The data path has provisions for completely independent parallel data flows giving true scalability to arbitrarily high throughput. In a preferred embodiment areas on the SLM a ...