1
Fred Pettinger, Carl White, Dave Marquardt, Sokol Ibrani, Eric Shero, Todd Dunn, Kyle Fondurulia, Mike Halpin: Process feed management for semiconductor substrate processing. ASM America, Snell & Wilmer, April 28, 2015: US09017481 (134 worldwide citation)

Embodiments related to managing the process feed conditions for a semiconductor process module are provided. In one example, a gas channel plate for a semiconductor process module is provided. The example gas channel plate includes a heat exchange surface including a plurality of heat exchange struc ...


2
Michael Halpin, Eric Shero, Carl White, Fred Alokozai, Jerry Winkler, Todd Dunn: Chamber sealing member. ASM IP Holding, Snell & Wilmer, April 14, 2015: US09005539 (54 worldwide citation)

A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the low ...


3
Andrew M Yednak III, Todd Dunn, Carl White, Michael Manasco: Deposition valve assembly and method of heating the same. ASM America, Snell & Wilmer, August 4, 2015: US09096931 (51 worldwide citation)

A valve assembly including a mounting block having a first surface, a plurality of valves connected to the mounting block first surface, at least one fluid line connecting the plurality of valves spaced apart from the mounting block first surface, a heating element spaced apart from the at least one ...


4
Todd Dunn, Carl White, Michael Halpin, Eric Shero, Jerry Winkler: Susceptor heater shim. ASM IP Holding, Snell & Wilmer, December 1, 2015: US09202727 (44 worldwide citation)

A substrate supporting assembly in a reaction space includes a heater, a substrate support member, and a shim positioned between the heater and the substrate support member. The shim may be removably secured between the heater and the substrate support member. The shim may further include an inner s ...


5
Todd Dunn, Fred Alokozai, Jerry Winkler, Michael Halpin: Susceptor heater and method of heating a substrate. ASM IP Holding, Snell & Wilmer, January 13, 2015: US08933375 (36 worldwide citation)

A wafer processing apparatus may include a susceptor having a top side and a backside, a susceptor heater having a spacing member and a heating member, a shim removably mounted between the susceptor and the susceptor heater, a cavity formed by the susceptor backside, the susceptor heater, and the sh ...


6
Todd Dunn, Fred Alokozai, Jerry Winkler, Michael Halpin: Susceptor heater and method of heating a substrate. ASM IP Holding, Snell & Wilmer, March 29, 2016: US09299595 (26 worldwide citation)

A wafer processing apparatus may include a susceptor having a top side and a backside, a susceptor heater having a spacing member and a heating member, a shim removably mounted between the susceptor and the susceptor heater, a cavity formed by the susceptor backside, the susceptor heater, and the sh ...


7
Todd Dunn, Carl White, Mike Halpin, Eric Shero, Herbert Terhorst, Jerry Winkler: Pulsed valve manifold for atomic layer deposition. ASM AMERICA, Knobbe Martens Olson & Bear, February 21, 2017: US09574268 (2 worldwide citation)

A vapor deposition device includes a reactor including a reaction chamber and an injector for injecting vapor into the reaction chamber. The device also includes a manifold for delivering vapor to the injector. The manifold includes a manifold body having an internal bore, a first distribution chann ...


8
Fred Pettinger, Carl White, Dave Marquardt, Sokol Ibrani, Eric Shero, Todd Dunn, Kyle Fondurulia, Mike Halpin: Process feed management for semiconductor substrate processing. ASM America, Snell & Wilmer, February 13, 2018: US09892908

Embodiments related to managing the process feed conditions for a semiconductor process module are provided. In one example, a gas channel plate for a semiconductor process module is provided. The example gas channel plate includes a heat exchange surface including a plurality of heat exchange struc ...


9
Todd Dunn, Gopinath Venktatramanan: Reflex training and improvement system. Reflex L L C, Thorpe North & Western, August 28, 2012: US08251818

A reflex training system operates on a computer or other processing system, having hand and foot controls for response to stimuli. The use of a computer allows the system to be portable and used in a variety of locations. The system is highly configurable and can be used for training for individuals ...