1
Raymond L J Schrijver, Tjarko A R van Empel, Marcel K M Baggen, Bernardus A J Luttikhuis, Yim Bun P Kwan, Erik R Loopstra: Purge gas systems for use in lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop, April 1, 2003: US06542220 (33 worldwide citation)

A lithographic apparatus has at least one compartment closely surrounding at least one of the mask and substrate holders but not either of the illumination or projection systems so as to reduce the volume that must be purged with gas transparent to the projection radiation. In a scanner, the compart ...


2
Sjoerd N L Donders, Tjarko A R van Empel: Mask clamping apparatus, e.g. for a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, November 12, 2002: US06480260 (18 worldwide citation)

An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.


3
Tjarko A R van Empel, Hans Jansen: Lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop, July 2, 2002: US06413701 (11 worldwide citation)

A lithographic projection apparatus includes, a radiation system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portio ...


4
Sjoerd N L Donders, Tjarko A R van Empel: Mask for clamping apparatus, e.g. for a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 4, 2010: USRE041307

An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.