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Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Timotheus Franciscus Sengers, Alexander Straaijer, Bob Streefkerk: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 11, 2006: US07075616 (230 worldwide citation)

In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, sub ...


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Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Timotheus Franciscus Sengers, Alexander Straaijer, Bob Streefkerk: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pitman, May 29, 2007: US07224436 (82 worldwide citation)

In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, sub ...


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Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 22, 2009: US07593093 (62 worldwide citation)

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or ot ...


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Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 5, 2009: US07528929 (19 worldwide citation)

An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liqu ...


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Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 15, 2011: US07907255 (8 worldwide citation)

A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final ...