1
Theodorus Petrus Maria Cadee, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens, Frederick Eduard De Jong, Koen Goorman, Boris Menchtchikov, Marco Koert Stavenga, Martin Frans Pierre Smeets, Aschwin Lodewijk Hendricus Johannes Van Meer, Bart Leonard Peter Schoondermark, Patricius Aloysius Jacobus Tinnemans, Stoyan Nihtianov: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 4, 2007: US07304715 (24 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patt ...


2
Arie Jeffrey Den Boef, Marcel Hendrikus Maria Beems, Theodorus Petrus Maria Cadee, Raymond Wilhelmus Louis Lafarre: Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, November 26, 2013: US08593646 (11 worldwide citation)

An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The subst ...


3

4
Jacob Willem Vink, Sjoerd Nicolaas Lambertus Donders, Theodorus Marinus Modderman, Theodorus Petrus Maria Cadee: Lithographic apparatus and apparatus adjustment method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 18, 2006: US07078715 (7 worldwide citation)

A lithographic projection apparatus includes a beam production system for projecting a patterned beam of radiation onto a target portion of a substrate, and a support table for supporting an article. The support table has a support surface and an array of protrusions extending from the support surfa ...


5
Ruud Antonius Catharina Maria Beerens, Theodorus Petrus Maria Cadee: Lithographic apparatus and removable member. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 10, 2015: US08976335 (3 worldwide citation)

A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus having a first object and a planar member mounted on the first object to improve thermal transfer to/from a second object.


6
Maurice Wijckmans, Martinus Agnes Willem Cuijpers, Martinus Hendrikus Antonius Leenders, Frits Van Der Meulen, Joost Jeroen Ottens, Theodorus Petrus Maria Cadee, Frederik Eduard De Jong, Wilhelmus Franciscus Johannes Simons, Edwin Augustinus Matheus Van Gompel, Martin Frans Pierre Smeets, Rob Jansen, Gerardus Adrianus Antonius Maria Kusters, Martijn Van Baren: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 16, 2014: US08913228 (2 worldwide citation)

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to co ...


7
Theodorus Petrus Maria Cadee, Noud Jan Gilissen, Rene Theodorus Petrus Compen, James Kennon: Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 19, 2014: US08810777 (2 worldwide citation)

A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviation ...


8
Johannes Petrus Martinus Bernardus Vermeulen, Antonius Franciscus Johannes De Groot, Theodorus Petrus Maria Cadee, Jeroen De Boeij: Lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, January 13, 2015: US08932042 (1 worldwide citation)

A lithography apparatus comprises a projection system arranged to transfer a pattern from a patterning device onto a substrate, a carrier, and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprise ...


9
Arnoud Cornelis Wassink, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Theodorus Petrus Maria Cadee, Vladimir Mihailovitch Krivtsun, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Paul Peter Anna Antonius Brom, Wouter Anthon Soer: Radiation system and lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 13, 2010: US07696492 (1 worldwide citation)

A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage dif ...


10
Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Theodorus Petrus Maria Cadee: Lithographic apparatus with a metrology system for measuring a position of a substrate table. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, June 20, 2017: US09684249 (1 worldwide citation)

A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology f ...