1
Tetsuo Taniguchi, Saburo Kamiya: Stage device and exposure apparatus. Nikon Corporation, Oliff & Berridge, May 24, 2005: US06897963 (223 worldwide citation)

A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is capable of measuring the position with high precision. When a movable stage moves from the position where the ...


2
Tetsuo Taniguchi, Masayuki Murayama: Projection exposure apparatus and method. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, December 17, 2002: US06496257 (171 worldwide citation)

Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the obj ...


3
Tsuneo Miyai, Yuji Imai, Tetsuo Taniguchi, Kousuke Suzuki: Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors. Nikon Corporation, Shapiro and Shapiro, December 3, 1996: US05581324 (93 worldwide citation)

A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive ...


4
Tetsuo Taniguchi: Focus detecting method and apparatus. Nikon Corporation, Armstrong Westerman Hattori McLeland & Naughton, July 22, 1997: US05650840 (93 worldwide citation)

A method of detecting a focus position of a projection optical system at a high throughput and with high accuracy. A sensor pattern (SP) which is provided on a wafer stage (WS) as a light-receiving part of a photoelectric sensor (PES) is moved in the direction of an optical axis (AX) of a projection ...


5
Tetsuo Taniguchi, Naomasa Shiraishi: Projection exposure apparatus. Nikon Corporation, Armstong Westerman Hattori McLeland & Naughton, October 14, 1997: US05677757 (89 worldwide citation)

A projection exposure apparatus having an illuminating system for irradiating a mask, which has a pattern, with illuminating light for exposure, and a projection optical system for projecting an image of the mask pattern onto a photosensitive substrate with predetermined image-forming characteristic ...


6
Naomasa Shiraishi, Tetsuo Taniguchi, Hidemi Kawai: Projection exposure apparatus. Nikon Corporation, Shapiro and Shapiro, May 26, 1992: US05117255 (87 worldwide citation)

An exposure apparatus for exposing on a substrate a pattern formed on a mask, comprises a projection optical system for forming the pattern on a predetermined focusing plane and projecting an image of the pattern on the substrate located to be substantially aligned with the focusing plane, driving m ...


7
Tetsuo Taniguchi, Nobutaka Magome, Naomasa Shiraishi: Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure. Nikon Corporation, Vorys Sater Seymour and Pease, June 20, 2000: US06078380 (73 worldwide citation)

In a projection exposure apparatus and method, the intensity distribution of illumination light for detecting an imaging characteristic of a projection optical system is set substantially equal to the intensity distribution of exposure illumination light. The intensity distribution of a secondary li ...


8
Toshihiko Tsuji, Tetsuo Taniguchi, Yuji Imai, Mizutani Hideo: Projection exposing apparatus. Nikon Corporation, Shapiro and Shapiro, June 13, 1995: US05424552 (71 worldwide citation)

A projection exposing apparatus for detecting a state of focus at two or more places in exposure region of a projection optical system by a focus state detection device. In accordance with the result of the detection of the focus state at the two or more places, the image forming characteristics of ...


9
Noboru Kato, Emiko Nogome, Hisatake Okamura, Teruhisa Tsuru, Tetsuo Taniguchi, Ken Tonegawa: Composite electronic component and frequency adjustment method of the same. Murata Manufacturing, Wegner Cantor Mueller & Player, August 18, 1992: US05140497 (71 worldwide citation)

A composite electronic component containing at least two circuit elements including an inductor. The composite electronic component comprises a component body including a laminated body of a plurality of non-conductive layers, an inductor electrode formed between either two adjacent non-conductive l ...


10
Tetsuo Taniguchi: Projection exposure method and apparatus. Nikon Corporation, Shapiro and Shapiro, February 24, 1998: US05721608 (69 worldwide citation)

A projection exposure apparatus has an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with light from a light source, a projection optical system for forming an image of the pattern of the mask on a photosensitive substrate, a mask stage for holding ...