1
Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Yasuhiro Yoshitake, Terushige Asakawa, Yuichi Ohyama, Hidekuni Sugimoto, Seiji Ishikawa, Masataka Shiba, Jun Nakazato, Makoto Ariga, Tetsuji Yokouchi, Toshimitsu Hamada, Ikuo Suzuki, Masami Ikota, Mari Nozoe, Isao Miyazaki, Yoshiharu Shigyo: Process control system. Hitachi, Hitachi Instruments Engineering, April 1, 2003: US06542830 (38 worldwide citation)

A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses ...


2
Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa: Projection aligner. Hitachi, Hitachi Ome Electronic, Antonelli Terry & Wands, July 1, 1986: US04598197 (20 worldwide citation)

A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and th ...


3
Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Yasuhiro Yoshitake, Terushige Asakawa, Yuichi Ohyama, Hidekuni Sugimoto, Seiji Ishikawa, Masataka Shiba, Jun Nakazato, Makoto Ariga, Tetsuji Yokouchi, Toshimitsu Hamada, Ikuo Suzuki, Masami Ikota, Mari Nozoe, Isao Miyazaki, Yoshiharu Shigyo: Process management system. Hitachi, Hitachi Engineering, Kenyon & Kenyon, June 29, 2004: US06757621 (15 worldwide citation)

A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses ...


4
Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa: Projection aligner with a sensor for monitoring light quantity. Hitachi, Hitachi Tokyo Electronics, Antonelli Terry & Wands, October 20, 1987: US04701608 (12 worldwide citation)

A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and th ...


5
Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa: Projection aligner method utilizing monitoring of light quantity. Hitachi, Hitachi Ome Electronic Co, Antonelli Terry & Wands, October 25, 1988: US04780606 (6 worldwide citation)

A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and th ...


6
Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Yasuhiro Yoshitake, Terushige Asakawa, Yuichi Ohyama, Hidekuni Sugimoto, Seiji Ishikawa, Masataka Shiba, Jun Nakazato, Makoto Ariga, Tetsuji Yokouchi, Toshimitsu Hamada, Ikuo Suzuki, Masami Ikota, Mari Nozoe, Isao Miyazaki, Yoshiharu Shigyo: Process management system. Hitachi, Kenyon & Kenyon, July 10, 2003: US20030130806-A1

A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses ...