1
Kazuya Kamon, Yasuhito Myoi, Teruo Miyamoto, Yoshie Noguchi, Masaaki Tanaka: Projection aligner. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, September 1, 1992: US05144362 (60 worldwide citation)

A projection aligner includes a light source, a condenser lens system for directing light from the light source onto a mask on which a circuit pattern is formed, a projecting lens system for collecting on the surface of a wafer the light transmitted through the mask, and a pupillary member disposed ...


2
Nobuyuki Zumoto, Teruo Miyamoto, Toshinori Yagi, Masaaki Tanaka: Optical transmission system and light radiating method. Mitsubishi Denki Kabushiki Kaisha, Wolf Greenfield & Sacks P C, November 4, 1997: US05684642 (54 worldwide citation)

An optical transmission system permitting any desired machining to be done by radiating to an object to be irradiated a laser beam having an optimum intensity distribution in the direction of its optical axis or in a plane perpendicular to the optical axis, comprising a laser oscillator 1, an optica ...


3
Teruo Miyamoto, Hiroyuki Yahara, Mitsuhiro Kawaguchi, Motoo Takahashi, Tatsuro Hirose, Takaaki Uda: Projector with inlet fan, outlet fan and ventilation duct structure for cooling an optical system. Mitsubishi Denki Kabushiki Kaisha, September 3, 2002: US06443575 (33 worldwide citation)

A projecter having a lamp, a lamp box containing the lamp, an outlet fan for discharging air from the lamp box, an optical system member which receives a light beam from the lamp and outputs an image light, an optical system box containing the optical system member, and an inlet fan for blowing outs ...


4
Kazuya Kamon, Teruo Miyamoto, Yasuhito Myoi: Projection exposure apparatus. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, November 23, 1993: US05264898 (32 worldwide citation)

A projection exposure apparatus for use in LSI production comprises a light source, a light condensing optical system through which light from the light source is condensed and applied to a mask carrying a circuit pattern, a projection lens system which projects the light transmitted through the mas ...


5
Nobuyuki Zumoto, Toshinori Yagi, Yasuhito Myoi, Yoshie Uchiyama, Masaaki Tanaka, Teruo Miyamoto, Masao Izumo: Optical machining apparatus. Mitsubishi Denki Kabushiki Kaisha, June 29, 1993: US05223693 (28 worldwide citation)

An optical machining apparatus for irradiating light from a light source onto a source to be machined to form a grooves in the surface. The apparatus uses a mask disposed in the path of light from the light source. The mask includes reflective parts for reflecting the light from the light source. Th ...


6
Masanori Kojima, Ko Nishino, Yasuhito Myoi, Masaaki Tanaka, Teruo Miyamoto, Fumio Suzuki, Fumio Itoh, Yoshisuke Otsuru: Projector apparatus. Mitsubishi Denki Kabushiki Kaisha, September 29, 1998: US05815221 (25 worldwide citation)

A polarizing beam splitter extracts orthogonally polarized light beams from natural light and distributes those to liquid crystal panels, which modulate polarization states of those polarized light beams in accordance with a luminance signal and chrominance signals of video signals, respectively. Th ...


7
Kazuya Kamon, Yasuhito Myoi, Teruo Miyamoto, Yoshie Noguchi, Masaaki Tanaka: Projection aligner. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, October 12, 1993: US05253040 (22 worldwide citation)

A projection aligner includes a light source, a condenser lens system for directing light from the light source onto a mask on which a circuit pattern is formed, a projecting lens system for collecting on the surface of a wafer the light transmitted through the mask, and an aperture member disposed ...


8
Toshio Ito, Yoshisuke Ohtsuru, Hisao Koizumi, Takio Okuda, Yasuhito Myoi, Toshimasa Tomoda, Masaaki Tanaka, Teruo Miyamoto, Toyomi Ohshige, Toshiyuki Yoneda, Fumio Suzuki, Kou Nishino, Kazuaki Matoba, Masanori Kojima, Hiroshi Kawamura, Kenji Kimura, Kenji Samejima, Naoki Kawamoto, Miki Fukada, Haruhiko Nagai, Kenji Maeno: Method and apparatus for image generation. Mitsubishi Denki Kabushiki Kaisha, Burns Doane Swecker & Mathis, January 26, 1999: US05864374 (16 worldwide citation)

A dichroic mirror for reflecting red light for optical separating and a dichroic mirror for reflecting red light for optical synthesizing are installed on the same plane in an image generating apparatus of the present invention. In addition, a dichroic mirror for reflecting blue light for optical se ...


9
Kazuya Kamon, Teruo Miyamoto: Projection exposure apparatus. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, May 10, 1994: US05311249 (12 worldwide citation)

A projection exposure apparatus includes a light source, a condenser lens for illuminating an illumination light emanating from the light source onto a mask on which a circuit pattern has been formed, a projection lens for condensing the illumination light which has passed through the mask onto a su ...


10
Teruo Miyamoto, Hideharu Tanaka, Mitsuhiro Kawaguchi, Tatsuro Hirose, Toshimitsu Iwai, Tomohiro Bessho: Light source device and projection type display capable of enclosing fragment herein in case of burst of discharge lamp during lighting. Mitsubishi Denki Kabushiki Kaisha, Birch Stewart Kolasch & Birch, March 23, 2004: US06709112 (4 worldwide citation)

It is an object to obtain a light source device and a projection type display device in which a fragment can be completely enclosed therein even if a discharge lamp bursts during lighting. During normal lighting of a discharge lamp (