1
Hiroshi Torihara, Takayoshi Tanabe, Kenichi Ukai, Nobuyuki Takahashi: Illumination device, method for driving the illumination device and display including the illumination device. Sharp Kabushiki Kaisha, Nixon & Vanderhye P C, May 23, 2000: US06066920 (102 worldwide citation)

An illumination device includes a cold cathode fluorescent tube having a heat capacity of 0.035 Wsec/.degree. C. or less per unit length (1 cm) of a glass tube of a fluorescent section of the cold cathode fluorescent tube. The illumination device has a superior operation characteristic at a low temp ...


2
Hisashi Oyama, Youko Ohta, Kenichi Ukai, Nobuyuki Takahashi, Takayoshi Tanabe, Hirohide Terasaki: Lighting apparatus. Sharp Kabushiki Kaisha, David G Conlin, Peter F Dike Bronstein Roberts & Cushman Corless, September 15, 1998: US05808708 (68 worldwide citation)

A lighting apparatus for irradiating a liquid crystal display panel from the back includes a light guiding plate having at least an end which is bent in a direction opposite to the liquid crystal display panel, and a light source disposed on the back surface of the light guiding plate with respect t ...


3
Eiichi Kobayashi, Makoto Shimizu, Takayoshi Tanabe, Shin ichiro Iwanaga: Radiation sensitive resin composition. JSR Corporation, Oblon Spivak McClelland Maier & Neustadt P C, October 24, 2000: US06136500 (38 worldwide citation)

Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensi ...


4
Takayoshi Tanabe, Eiichi Kobayashi, Makoto Shimizu, Shin ichiro Iwanaga: Radiation sensitive resin composition. JSR Corporation, Oblon Spivak McClelland Maier & Neustadt P C, November 30, 1999: US05994022 (25 worldwide citation)

A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which ...


5
Takayoshi Tanabe, Takatoshi Ishigaki, Shuji Tsuchikawa, Shinichi Kimura: Low friction polyamide, polyethylene, P.T.F.E. resin. Bando Chemical, Marshall O Toole Gerstein Murray & Bicknell, April 19, 1994: US05304422 (16 worldwide citation)

A polyamide resin composition comprising: (a) 100 parts by weight of a polyamide; (b) from about 1 part to about 80 parts by weight of an aromatic polyamide fiber; (c) from about 3 parts to about 80 parts by weight of a polytetrafluoroethylene; and (d) from about 1 part to about 20 parts by weight o ...


6
Hiroaki Nemoto, Takayoshi Tanabe, Yoshiji Yumoto, Takao Miura: Reflection preventing film and process for forming resist pattern using the same. Japan Synthetic Rubber, Oblon Spivak McClelland Maier & Neustadt, April 25, 1995: US05410005 (15 worldwide citation)

A reflection preventing film comprising a copolymer, its salt or both of them, the copolymer having at least one recurring unit selected from the group consisting of recurring units represented by formulas (1) and (2) and at least one recurring unit represented by formula (3): ##STR1## wherein R.sup ...


7
Shinichiro Iwanaga, Akihiko Sakurai, Takayoshi Tanabe, Akira Tsuji: Radiation sensitive composition. JSR Corporation, Oblon Spivak McClelland Maier & Neustadt P C, October 5, 1999: US05962180 (12 worldwide citation)

A radiation sensitive composition comprising (A) a copolymer comprising recurring units of a p-hydroxystyrene unit and a styrene unit having an acetal group or a ketal group at the p-position, (B) a copolymer comprising recurring units of a t-butyl (meth)acrylate unit and a p-hydroxystyrene unit, an ...


8
Tetsuya Yamamura, Takayoshi Tanabe, Takashi Ukachi: Resin composition and three-dimensional object. DSM, JSR Corporation, Japan Fine Coatings, Pillsbury Winthrop, February 3, 2004: US06685869 (12 worldwide citation)

A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group compris ...


9
Katsuo Koshimura, Takayoshi Tanabe, Hozumi Sato, Noboru Oshima, Takashi Nishioka, Yoshiharu Hashiguchi: Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer. Japan Synthetic Rubber, Oblon Spivak McClelland Maier & Neustadt P C, March 24, 1998: US05731129 (10 worldwide citation)

A water-developable photosensitive resin composition which exhibits a small swelling, small reduction in strength and small dimension change when developed with water and which has an excellent balance of characteristics. Said composition comprises (1) a oarboxyl group-containing diene polymer, (2) ...


10
Toshiaki Ikemura, Eiichi Kobayashi, Takayoshi Tanabe, Shin ichiro Iwanaga: Radiation sensitive resin composition. JSR Corporation, Oblon Spivak McClelland Maier & Neustadt P C, May 22, 2001: US06235446 (9 worldwide citation)

A radiation sensitive resin composition comprising (A) a copolymer possessing recurring units of the formulas (1), (2), and (3),



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