1
Takashi Chiba, Satoru Koga, Minji Senda: System for controlling key storage unit which controls access to main storage. Fujitsu, Staas & Halsey, May 13, 1986: US04589064 (164 worldwide citation)

A data processing apparatus includes at least one processing unit, a main storage unit, a main storage control unit, a key storage unit and a key storage control unit. The main storage unit is divided into blocks and the key storage unit stores main storage protection keys, each of which corresponds ...


2
Takashi Chiba: Memory control system using a single access request for doubleword data transfers from both odd and even memory banks. Fujitsu, Staas & Halsey, September 12, 1989: US04866603 (42 worldwide citation)

A memory access control system has a main memory having a plurality of memory banks divided into two groups, thus enabling parallel processing for data, a command/address bus line, a write data bus line, a read data bus line, and a device for simultaneously activating one request for access to the m ...


3
Takashi Chiba: Inter-configuration changing controller based upon the connection and configuration information among plurality of clusters and the global storage. Fujitsu, Staas & Halsey, June 23, 1992: US05125081 (34 worldwide citation)

A configuration control system for changing a system configuration of a data processing system. The configuration control system has a plurality of clusters and at least one global storage unit. Each of the clusters has a channel processing unit, at least one central processing unit, at least one ma ...


4
Takashi Chiba, Jun Numata: Radiation-sensitive resin composition. JSR Corporation, Steven B Kelber, Piper Marbury Rudnick & Wolfe, August 28, 2001: US06280900 (18 worldwide citation)

A radiation-sensitive resin composition comprising (a) a resin represented by a copolymer of p-hydroxystyrene and t-butyl (meth)acrylate and a copolymer of p-hydroxystyrene and p-t-butoxystyrene, (b) a photoacid generator, and (c) a quaternary ammonium salt compound represented by tetramethylammoniu ...


5
Takashi Chiba: Buffer memory control device having priority control units for priority processing set blocks and unit blocks in a buffer memory. Fujitsu, Staas & Halsey, September 19, 1978: US04115855 (17 worldwide citation)

For extracting a unit data block of the lowest priority from a plurality of unit data blocks stored in a buffer memory of large capacity, the unit data blocks are divided into set blocks, each comprising a predetermined number of unit data blocks, and priority levels of the set blocks are determined ...


6
Takashi Chiba, Satoru Koga: Access control system for a channel buffer. Fujitsu, Staas & Halsey, June 5, 1984: US04453216 (17 worldwide citation)

A computer system comprising a plurality of channels, at least one main storage unit, and a memory control unit having a channel buffer between the main storage unit and the channels. The channel buffer comprises a memory portion divided into a plurality of tag blocks, tag lines, and a data memory p ...


7
Masaru Igusa, Takashi Chiba: Control device for a coffee roaster. Sanden Corporation, Banner Birch McKie & Beckett, October 3, 1989: US04871901 (14 worldwide citation)

A coffee roasting apparatus is disclosed. The coffee roasting apparatus comprises a cylindrical container, a cylindrical drum rotatably extended within the center portion of the container, and a heater element diposed within the drum. The apparatus includes a blower device to cause air circulation w ...


8
Toshio Mikiya, Keisuke Shimada, Munenori Yamaguchi, Takashi Chiba, Kenji Ohtsuka: Electric drill apparatus. Nitto Kohki, Brinks Hofer Gilson & Lione, October 17, 2006: US07121773 (13 worldwide citation)

An electric drill apparatus having a low profile is provided which comprises an annular cutter, a motor for rotating the annular cutter, a rotary shaft assembly for rotating the annular cutter attached to its leading end about a rotating, a rotation reduction mechanism disposed between the motor and ...


9
Takashi Chiba, Toru Kimura, Tomohiro Utaka, Hiroki Nakagawa, Hirokazu Sakakibara, Hiroshi Dougauchi: Copolymer and top coating composition. JSR Corporation, Ditthavong Mori & Steiner P C, August 24, 2010: US07781142 (11 worldwide citation)

A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which i ...


10
Kazuhide Hasebe, Mitsuhiro Okada, Takashi Chiba, Jun Ogawa: Method for removing silicon oxide film and processing apparatus. Tokyo Electron, Smith Gambrell & Russell, November 3, 2009: US07611995 (7 worldwide citation)

A silicon dioxide film removing method is capable of removing a silicon dioxide film, such as a natural oxide film or a chemical oxide film, at a temperature considerably higher than a room temperature. The silicon dioxide film removing method of removing a silicon dioxide film formed on a workpiece ...