1
Masato Muraki, Masato Aketagawa, Takahisa Shiozawa: Illuminating device. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 4, 1990: US04974919 (94 worldwide citation)

An illumination device includes a light source for supplying light, an optical system for forming plural light fluxes from the light supplied by the light source, a scanning system disposed to receive the light fluxes formed by the forming optical system and for scanning the light fluxes substantial ...


2
Takahisa Shiozawa, Masato Muraki, Hiroyuki Ishii, Shigeru Hayata: Illumination device for projection exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, September 6, 1994: US05345292 (84 worldwide citation)

An illumination device, includes a secondary light source forming system having a deflecting member with a conical light deflecting surface for transforming received light into substantially ring-like light, the secondary light source forming system forming a ring-like secondary light source by usin ...


3
Takahisa Shiozawa: Exposure apparatus and device manufacturing method. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, October 21, 2003: US06636295 (66 worldwide citation)

An illumination system for lithography includes an optical system for projecting light from a laser onto a mask. The optical system includes a birefringent element being effective to dissolve polarization of light from the laser. The birefringent element is made of CaF


4
Takahisa Shiozawa: Exposure apparatus and device manufacturing method for projecting light from a secondary light source onto a mask or pattern. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, November 4, 1997: US05684567 (55 worldwide citation)

An exposure apparatus includes a light source, first, second and third optical integrators disposed along an optical axis, for receiving light from the light source, each of the integrators having lens elements arrayed in a direction perpendicular to the optical axis, a first condensing optical syst ...


5
Naoto Sano, Masato Aketagawa, Hitoshi Nakano, Takahisa Shiozawa: Exposure method and apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, June 9, 1992: US05121160 (53 worldwide citation)

An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any ...


6
Takahisa Shiozawa: Exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 12, 1995: US05475491 (44 worldwide citation)

An exposure apparatus includes a supplying portion for supplying a radiation beam; a detector; an optical arrangement operable to amplitude-divide the radiation beam from the supplying portion to produce first and second beams, the optical arrangement being effective to direct the first beam to a wo ...


7
Takahisa Shiozawa: Illumination device. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, October 17, 1995: US05459547 (39 worldwide citation)

An illumination device includes first and second optical integrators disposed along an optical axis and each having lens elements arrayed in a direction intersecting the optical axis; a condensing optical system for collecting light passed through the first and second optical integrators, to form a ...


8
Takahisa Shiozawa, Tsuneo Kanda, Akiyoshi Suzuki: Exposure apparatus with a function for controlling alignment by use of latent images. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 18, 1992: US05140366 (31 worldwide citation)

Disclosed is an exposure apparatus for printing a pattern of a reticle on different shot areas of the wafer in a step-and-repeat manner. In the disclosed apparatus, an image of an alignment mark of the reticle is printed, by use of a projection lens system, on each of some shot areas of the wafer wh ...


9
Takahisa Shiozawa, Masato Muraki, Hiroyuki Ishii, Shigeru Hayata: Projection exposure apparatus having illumination device with ring-like or spot-like light source. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 10, 1998: US05726740 (24 worldwide citation)

An illumination device, includes a secondary light source forming system having a deflecting member with a conical light deflecting surface for transforming received light into substantially ring-like light, the secondary light source forming system forming a ring-like secondary light source by usin ...


10
Takahisa Shiozawa: Exposure apparatus and microdevice manufacturing method using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, February 13, 1996: US05491534 (24 worldwide citation)

An exposure apparatus for exposing a substrate with pulses of light supplied sequentially, is disclosed. The apparatus includes a detector for detecting the light quantity of each pulse, and a controller for controlling the timing of exposure of the substrate with a pulse to be emitted, on the basis ...