51
Kenichi Mitsumori, Tadahiro Ohmi: Wet treatment apparatus. Alps Electric, Tadahiro Ohmi, Brinks Hofer Gilson & Lione, October 7, 2003: US06629540 (27 worldwide citation)

A wet treatment apparatus includes a nozzle having an approximately rectangular introduction opening surface that is open toward a substrate to be treated and an approximately rectangular recovery opening surface that is open toward the substrate, these opening surfaces being flush with each other a ...


52
Takashi Imaoka, Hiroshi Morita, Isamu Sugiyama, Tadahiro Ohmi, Masaki Hirayama: Reductive heat exchange water and heat exchange system using such water. Organo Corporation, Rosenthal & Osha L, February 26, 2002: US06350376 (27 worldwide citation)

Heat exchange water for cooling an object of heat exchange such as machinery, air, or liquid, which serves to prevent oxidation and deterioration of metal materials used in pipes for supplying/circulating the heat exchange water or in the liquid ends of the heat exchanger, to suppress growth of alga ...


53
Tadahiro Ohmi, Tsutomu Shinohara, Michio Yamaji, Nobukazu Ikeda, Kenji Yamamoto: Pipe joint with a gasket retainer. Fujikin Incorporated, Armstrong Westerman Hattori McLeland & Naughton, November 22, 1994: US05366261 (25 worldwide citation)

A pipe joint comprises a pair of tubular joint members having a gasket holding annular projection on each of butting faces thereof, an annular gasket interposed between the butting end faces of the joint members, and a nut for connecting the joint members together. When the nut is tightened up, an i ...


54
Tadahiro Ohmi, Kazuhiko Sugiyama, Fumio Nakahara, Masaru Umeda: Cylinder cabinet piping system. Tadahiro OHMI, Albert L Jeffers, Anthony Niewyk, September 26, 1989: US04869301 (25 worldwide citation)

The cylinder cabinet piping system of this invention has a system to supply a purge gas continuously to the main line, or to the main line and the branch line, thereby to prevent stagnation of gas in the purge gas line and to supply a super-high-purity gas to a process unit.


55
Jun ichi Nishizawa, Tadahiro Ohmi, Nobuo Takeda: Static induction transistor and semiconductor integrated circuit using hetero-junction. Zaidan Hojin Handotai Kenkyu Shinkokai, Cushman Darby & Cushman, November 20, 1984: US04484207 (25 worldwide citation)

A hetero-junction static induction transistor (SIT) of normal or upside-down type to be operated by applying a forward bias across the gate and source regions, in which at least its source region and gate region among the source, drain and gate regions is formed with a material having a band gap bro ...


56
Nobuyuki Okamura, Atsushi Yamagami, Tadahiro Ohmi, Haruhiro Harry Goto, Tadashi Shibata: Plasma processing apparatus. Canon Kabushiki Kaisha Applied Materials Japan, Fitzpatrick Cella Harper & Scinto, March 17, 1998: US05728278 (24 worldwide citation)

A plasma processing apparatus has a vacuum container which contains a pair of electrodes for causing a discharge for generating a plasma, and a shielding plate for separating a plasma processing region including a space between the electrodes from a region in contact with the inner wall of the vacuu ...


57
Junichi Nishizawa, Tadahiro Ohmi: Insulated gate transistor having reduced channel length. Handotai Kenkyu Shinkokai, Sughrue Mion Zinn Macpeak & Seas, April 21, 1987: US04660062 (24 worldwide citation)

An insulated gate transistor including a semiconductor substrate, high impurity source and drain regions formed above a channel region of low conductivity, a high impurity concentration region having a conductivity type opposite to that of the source region, a gate insulating layer extending into th ...


58
Tadahiro Ohmi, Hiroshi Morokoshi, Michio Yamaji, Shigeaki Tanaka, Keiji Hirao, Yuji Kawano, Takashi Hirose, Kosuke Yokoyama, Michio Kuramochi, Masayuki Hatano, Nobukazu Ikeda: Fluid control apparatus. Tadahiro Ohmi, Fujikin Incorporated, Armstrong Westerman & Hattori, September 9, 2003: US06615871 (24 worldwide citation)

An on-off device disposed at each of the inlet and the outlet of a fluid controller is one of five kinds of on-off devices, i.e., on-off device having a two-port valve, on-off device having a two-port valve and a three-port valve, on-off device having a two-port valve and two three-port valves, on-o ...


59
Tadahiro Ohmi, Seiichi Iida, Satoshi Kagatsume, Jun Hirose, Kouji Nishino, Nobukazu Ikeda, Michio Yamaji, Ryousuke Dohi, Kazuhiro Yoshikawa, Mutsunori Koyomogi, Tomio Uno, Eiji Ideta, Takashi Hirose: Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers. Fujikin Incorporated, Tadahiro Ohmi, Tokyo Electron, Griffin & Szipl P C, October 16, 2001: US06302130 (24 worldwide citation)

A method and apparatus for detection of clogging of an orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow rate control unit and enhance its safety. The apparatus of detecting cloggin ...


60
Tadahiro Ohmi, Seiichi Iida, Satoshi Kagatsume, Jun Hirose, Kazuo Fukasawa, Hiroshi Koizumi, Hideki Nagaoka, Tomio Uno, Kouji Nishino, Nobukazu Ikeda, Ryousuke Dohi, Eiji Ideta: Method of detecting abnormalities in flow rate in pressure-type flow controller. Tadahiro Ohmi, Tokyo Electron, Fujikin Incorporated, Griffin & Szipl P C, September 17, 2002: US06450190 (24 worldwide citation)

A method of detecting abnormalities in flow rate in pressure-type flow controller. The method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice—the pressure-type flow controller wherein with the upstream pressure P