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Masaki Hirayama, Tadahiro Ohmi, Tatsushi Yamamoto, Takamitsu Tadera: Plasma process device. Tadahiro Ohmi, Sharp Kabushiki Kaisha, David G Conlin, David A Tucker, Dike Bronstein Roberts & Cushman IP Group Edwards & Angell, September 10, 2002: US06446573 (59 worldwide citation)

A plasma process device capable of forming homogeneous plasma and coping with a large size substrate less costly can be obtained. The plasma process device includes a processing chamber, microwave guiding means, a shower plate and a reaction gas supply passage. The microwave guiding means guides a m ...


12
Tadahiro Ohmi, Nobuyoshi Tanaka: Photoelectric converter. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 11, 1987: US04686554 (59 worldwide citation)

A photoelectric converter comprising a photosensor element, a typical example of the photosensor element comprising: a transistor including an n or n.sup.+ collector region an n.sup.- region disposed contiguous to the collector region, a p base region disposed contiguous to the n.sup.- region, an n. ...


13
Tadahiro Ohmi, Keiji Hirao, Yukio Minami, Michio Yamaji, Takashi Hirose, Nobukazu Ikeda: Fluid control device. Tadahiro Ohmi, Fujikin Incorporated, Armstrong Westerman Hattori McLeland & Naughton, July 10, 2001: US06257270 (58 worldwide citation)

A fluid control device has formed in a valve main body a main channel communicating with an inlet of a channel within a massflow controller, and a relatively long subchannel and a relatively short subchannel both communicating with the main channel. The process gas to be assure of high purity is pas ...


14
Tadahiro Ohmi, Keiji Hirao, Yukio Minami, Michio Yamaji, Takashi Hirose, Nobukazu Ikeda: Fluid control device. Tadahiro Ohmi, Fujikin Incorporated, Armstrong Westerman Hattori McLeland and Naughton, November 2, 1999: US05975112 (58 worldwide citation)

A fluid control device has formed in a valve main body a main channel communicating with an inlet of a channel within a massflow controller, and a relatively long subchannel and a relatively short subchannel both communicating with the main channel. The process gas to be assure of high purity is pas ...


15
Akira Nakano, Tadahiro Ohmi: Plasma processing apparatus and method capable of performing uniform plasma treatment by control of excitation power. Alps Electric, Tadahiro Ohmi, Beyer Weaver & Thomas, September 21, 2004: US06792889 (57 worldwide citation)

A plasma processing apparatus includes a chassis accommodating an impedance matching circuit. The impedance matching circuit is placed between an RF generator and a plasma excitation electrode. Magnetic probes for detecting a magnetic field generated at a slit in a sidewall of the chassis are placed ...


16
Tadahiro Ohmi, Masaki Hirayama, Haruyuki Takano, Yusuke Hirayama: Plasma etching device. Tadahiro Ohmi, Tokyo Electron, Randall J Knuth, July 1, 2003: US06585851 (53 worldwide citation)

A plasma etching device which has an auxiliary electrode enabling realization of a uniform plasma density of generated plasma on the surface of a base and which enables uniform etching with respect to the base without depending upon pressure and without rotating a magnetic field applying means. The ...


17
Tadahiro Ohmi, Akinobu Teramoto, Hidetoshi Wakamatsu, Yasuo Kobayashi: Semiconductor device and method for manufacturing the same. Tadahiro Ohmi, Tokyo Electron, Crowell & Moring, April 21, 2009: US07521324 (47 worldwide citation)

In order to provide a semiconductor device having good quality by keeping the relative permittivity of a High-K insulation film in a high state, or to provide a method for manufacturing a semiconductor device in which the relative permittivity of the High-K insulation film can be kept in a high stat ...


18
Tadahiro Ohmi, Yohichi Kanno, Osamu Uchisawa, Kazuhiko Sato: Metal diaphragm valve. Motoyama Eng Works Lts, Nilsson Robbins Dalgarn Berliner Carson & Wurst, May 9, 1989: US04828219 (47 worldwide citation)

A metal diaphragm valve in which the interior of a valve casing is divided, by means of a metal diaphragm, thereby defining a valve chamber. Inlet hole and outlet hole are connected to the valve chamber. A valve seat is provided between the inlet and outlet holes, inside the valve chamber. A valve d ...


19
Tadahiro Ohmi, Koji Nishino, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Koji Kawada, Ryosuke Dohi, Hiroyuki Fukuda: Pressure type flow rate control apparatus. Fujikin Incorporated, Tadahiro Ohmi, Griffin Butler Whisenhunt & Szipl, October 6, 1998: US05816285 (46 worldwide citation)

A pressure type flow rate control apparatus (1) controls flow rate of a fluid in an environment where a ratio of P2/P1 between an absolute pressure P1 at an upstream side of an orifice and an absolute pressure P2 at a downstream side of the orifice is maintained at a value less than about 0.7. The a ...


20
Tadahiro Ohmi, Naomichi Yonekawa, Hiroyuki Horiki, Toshimitsu Kaji, Fumitomo Kunimoto, Takeo Tamaki: Rotary cleaning method with chemical solutions and rotary cleaning apparatus with chemical solutions. Tadahiro Ohmi, Nisso Engineering, MTC, Baker & Daniels, January 30, 1996: US05487398 (46 worldwide citation)

To provide a cleaning method and a cleaning apparatus for decreasing the total cost by producing high-performance semiconductor using silicon wafers with cleaner surface, decreasing the semiconductor production cost, decreasing the consumption of chemical solutions and the cleaning time by using a n ...



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