1
Phan Khoi A, Rangarajan Bharath, Singh Bhanwar, Subramanian Ramkumar: Refractive index system monitor and control for immersion lithography. Advanced Micro Devices, Phan Khoi A, Rangarajan Bharath, Singh Bhanwar, Subramanian Ramkumar, COLLOPY Daniel R, March 3, 2005: WO/2005/019935 (356 worldwide citation)

A system and/or method are disclosed for measuring (250) and/or controlling (260) refractive index (n) and/or lithographic constant (k) of an immersion medium (210) utilized in connection with immersion lithography. A known grating structure (602) is built upon a substrate (220). A refractive index ...


2
Subramanian Ramkumar, Singh Bhanwar, Phan Khoi A: Use of supercritical fluid to dry wafer and clean lens in immersion lithography. Advanced Micro Devices, Spansion, Subramanian Ramkumar, Singh Bhanwar, Phan Khoi A, DRAKE Paul S, January 11, 2007: WO/2007/005362 (12 worldwide citation)

Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an immersion space contacting the lens and the photoresist; removing the immersion liquid from the immersion sp ...


3
Casadevall Gemma, Subramanian Ramkumar, Barclay Brian, Allphin Clark, Shivanand Padmaja, Yam Noymi V: Sustained drug release composition demonstrating an ascending zero order release pattern, methods of manufacturing such a composition. Alza Corporation, Casadevall Gemma, Subramanian Ramkumar, Barclay Brian, Allphin Clark, Shivanand Padmaja, Yam Noymi V, ABRAHAM David, February 16, 2006: WO/2006/017537 (6 worldwide citation)

Disclosed are dosage forms and methods for sustained release of a drug including : a delay layer comprising a polymeric matrix, and microencapsulated drug, wherein the delay layer is substantially free of non-microencapsulated drug; and a second layer including a polymeric matrix, and non-microencap ...


4
Sinclair Ii Robert E, Perkins Gilma Annuska, Winser Michael Edward D, Subramanian Ramkumar, Ried Paul: Personalization of user accessibility options. Microsoft, June 28, 2006: EP1674975-A2 (5 worldwide citation)

A computing environment can dynamically respond to user preferences and personal abilities by enabling computer users to configure their computing experience by implicitly gathering information about the users' needs. The system can detect users' issues during the natural course of interaction with ...


5
Sinclair Robert E Ii, Perkins Gilma Annuska, Winser Michael Edward Dulac, Subramanian Ramkumar, Reid Paul: Personalization of user accessibility option. Microsoft, July 6, 2006: JP2006-178966 (2 worldwide citation)

PROBLEM TO BE SOLVED: To provide a computing environment dynamically complying with a user preference and personal ability.SOLUTION: By collecting information about needs of a computer user implicitly (automatically), the user can set his/her own computing experience. The system detects a problem (f ...


6
Reyes Iran, Lee Julie, Barclay Brian L, Davar Nipun, Subramanian Ramkumar: Osmotic dosage form with controlled release and fast release aspects. Alza Corporation, Reyes Iran, Lee Julie, Barclay Brian L, Davar Nipun, Subramanian Ramkumar, NWANERI Angela, April 19, 2007: WO/2007/044234 (1 worldwide citation)

Disclosed are osmotic dosage forms including a semi-permeable membrane; a first and a second orifice in the semi-permeable membrane located at opposite ends of the semi-permeable membrane; a controlled release drug layer located adjacent to the first orifice and within the semi-permeable membrane; a ...


7
Phan Khoi A, Singh Bhanwar, Rangarajan Bharath, Subramanian Ramkumar: Comprehensive integrated lithographic process control system based on product design and yield feedback system. Advanced Micro Devices, April 24, 2002: GB2410834-A

The present invention provides systems and methods that facilitate performing fabrication process. Critical parameters are valued collectively as a quality matrix, which weights respective parameters according to their importance to one or more design goals. The critical parameters are weighted by c ...


8
Tripsas Nicholas, Buynoski Matthew S, Pangrle Suzette, Okoroanyanwu Uzodinma, Hui Angela T, Lyons Christopher F, Subramanian Ramkumar, Lopatin Sergey D, Ngo Minh Van, Khathuria Ashok M, Chang Mark S, Cheung Patrick K, Oglesby Jane V: Polymer memory device formed in via opening. Advanced Micro Devices, April 19, 2006: GB2419231-A

One aspect of the present invention relates to a method of fabricating a polymer memory device in a via. The method involves providing a semiconductor substrate having at least one metal-containing layer thereon, forming at least one copper contact in the metal-containing layer, forming at least one ...


9
Oglesby Jane V, Lyons Christopher F, Subramanian Ramkumar, Hui Angela T, Ngo Minh Van, Pangrle Suzette: Spin on polymers for organic memory devices. Advanced Micro Devices, December 14, 2005: GB2415092-A

A method of making organic memory cells (104) made of two electrodes (106, 108) with a controllably conductive media (110) between the two electrodes (106, 108) is disclosed. The controllably conductive media (110) contains an organic semiconductor layer (112) and passive layer (114). The organic se ...


10
Subramanian Ramkumar, Singh Bhanwar, Phan Khoi A: Use of supercritical fluid to dry wafer and clean lens in immersion lithography. Advanced Micro Devices, Spansion, April 2, 2008: GB2442402-A

Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an immersion space contacting the lens and the photoresist; removing the immersion liquid from the immersion sp ...



Click the thumbnails below to visualize the patent trend.