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Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Josephus Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Scholtes: Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, September 8, 2009: US07586108 (31 worldwide citation)

The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 1 ...


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Theodorus Petrus Maria Cadee, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens, Frederick Eduard De Jong, Koen Goorman, Boris Menchtchikov, Marco Koert Stavenga, Martin Frans Pierre Smeets, Aschwin Lodewijk Hendricus Johannes Van Meer, Bart Leonard Peter Schoondermark, Patricius Aloysius Jacobus Tinnemans, Stoyan Nihtianov: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 4, 2007: US07304715 (24 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patt ...


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Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Joseph Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Scholtes: Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 20, 2012: US08138485 (19 worldwide citation)

A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. ...


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Anastasius Jacobus Anicetus Bruinsma, Frank Staals, Robert Jan Van Wijk, Stoyan Nihtianov: Level sensor, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 12, 2006: US07148494 (4 worldwide citation)

The invention relates to a level sensor for use in a lithographic apparatus that determines a surface height of a substrate. The level sensor includes an emitter and a receiver, wherein the emitter is arranged to emit a signal directed to a predetermined position on the surface of the substrate, suc ...


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Frits Van Der Meulen, Henrikus Herman Marie Cox, Martijn Houkes, Robertus Johannes Van Vliet, Stoyan Nihtianov, Petrus Wilhelmus Josephus Maria Kemper, Roland Petrus Hendrikus Hanegraaf: Lithographic apparatus immersion damage control. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 30, 2007: US07170583 (3 worldwide citation)

A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to sup ...


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Hans Butler, Stoyan Nihtianov, Petrus Wilhelmus Josephus Maria Kemper: Wireless signaling in a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 13, 2007: US07190437 (3 worldwide citation)

A lithographic apparatus capable of wirelessly communicating control and power signals, is presented herein. In one embodiment, the apparatus comprises an illumination system to provide a beam of radiation, a support structure configured to support a patterning device that imparts the beam of radiat ...


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Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Josephus Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Scholtes: Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, April 23, 2013: US08426831 (2 worldwide citation)

In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed wit ...


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Olaf Hubertus Wilhelmus Van Bruggen, Marcel Koenraad Marie Baggen, Johannes Roland Dassel, Remko Wakker, Stoyan Nihtianov, Frank Auer, Frits Van Der Meulen, Patrick David Vogelsang, Martinus Cornelis Reijnen, Tom Van Zutphen: Lithographic apparatus and position sensor. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, November 9, 2010: US07830495 (1 worldwide citation)

A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support ...


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