1
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, August 17, 2004: US06778257 (424 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


2
Mark L Oskotsky, Stanislav Smirnov: High numerical aperture projection system and method for microlithography. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, January 8, 2008: US07317583 (8 worldwide citation)

The present invention relates to a high numerical aperture exposure system having a wafer. The exposure system in the present invention includes a beam-splitter, a reticle, a reticle optical group, where the reticle optical group is placed between the reticle and the beam-splitter, a concave mirror, ...


3
Stanislav Smirnov, Mark Oskotsky: Optical system for maskless lithography. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, September 19, 2006: US07110082 (6 worldwide citation)

A maskless lithography system including an illuminating system, a SLM having a non-linear shape (e.g., curved, concave, spherical, etc.), an exposure system, and a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system. In some embodiments, a ...


4
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 4, 2006: US07023525 (5 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


5
Arno Jan Bleeker, Johannes Jacobus Matheus Baselmans, Marce Mathijs Theodore Marie Dierichs, Stanislav Smirnov, Christian Wagner, Lev Ryzhikov, Kars Zeger Troost: Lithographic apparatus and device manufacturing method. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, December 28, 2010: US07859647 (4 worldwide citation)

A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radia ...


6
Stanislav Smirnov, Mark Oskotsky: Off-axis catadioptric projection optical system for lithography. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, March 31, 2009: US07511798 (1 worldwide citation)

An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens g ...


7
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. Asml Netherlands, Pillsbury Winthrop, February 13, 2003: US20030030781-A1 (1 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


8
Stanislav Smirnov, Mark Oskotsky: Off-axis catadioptric projection optical system for lithography. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, November 16, 2010: US07834979

An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. The optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated li ...


9
Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov, Chien Hung Tseng, Armand Eugene Albert Koolen: Method and device for focusing in an inspection system. ASML NETHERLANDS, ASML HOLDING, Pillsbury Winthrop Shaw Pittman, October 23, 2018: US10107761

An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a ...


10
Lev Ryzhikov, Stanislav Smirnov: Relay lens used in an illumination system of a lithography system. ASML Holding, Stern Kessler Goldstein & Fox PLLC, October 30, 2007: US07289277

A relay lens is provided in an illumination system for use in microlithography. The relay lens can be used to uniformly illuminate a field at a reticle by telecentric light beams with variable aperture size. The relay lens can include first, second, and third lens groups. At least one of the second ...