1
Tomoko Ohtsuki, Soichi Owa: Ultraviolet laser apparatus and exposure apparatus using same. Nikon Corporation, Westerman Hattori Daniels & Adrian, April 4, 2006: US07023610 (199 worldwide citation)

An ultraviolet laser apparatus having a single-wavelength oscillating laser generating laser light between an infrared band and a visible band, an optical amplifier for amplifying the laser light, and a wavelength converting portion converting the amplified laser light into ultraviolet light using a ...


2
Tomoko Ohtsuki, Soichi Owa: Ultraviolet laser apparatus and exposure apparatus using same. Nikon Corporation, Armstrong Westerman & Hattori, July 8, 2003: US06590698 (87 worldwide citation)

An ultraviolet laser apparatus has a laser generating single-wavelength light between infrared and visible, a fiber optical amplifier for amplifying the laser light, and a converting portion converting the amplified laser light into single-wavelength ultraviolet light, using a non-linear optical cry ...


3
Tomoko Ohtsuki, Soichi Owa, Niichi Atsumi, Masaaki Doi: Light source unit and wavelength stabilizing control method, exposure apparatus and exposure method, method of making exposure apparatus, and device manufacturing method and device. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, August 29, 2006: US07098992 (70 worldwide citation)

The light source unit includes a single wavelength oscillation light source, a light generating portion which has an optical modulator converting and emitting light from the light source into a pulse light, a light amplifying portion made up of an optical fiber group in which each fiber has a fiber ...


4
Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa: Exposure apparatus and method for producing device. Nikon Corporation, Oliff & Berridge, June 17, 2008: US07388649 (69 worldwide citation)

There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the subst ...


5
Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hiroyuki Nagasaka: Exposure method, substrate stage, exposure apparatus, and device manufacturing method. Nikon Corporation, Oliff & Berridge, January 27, 2009: US07483119 (42 worldwide citation)

In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substra ...


6
Masahiro Nei, Naoyuki Kobayashi, Dai Arai, Soichi Owa: Exposure apparatus and method for producing device. Nikon Corporation, Oliff & Berridge, September 15, 2009: US07589820 (37 worldwide citation)

An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery ...


7
Yasuhiro Omura, Naomasa Shiraishi, Issey Tanaka, Soichi Owa, Toshihiko Ozawa, Shunsuke Niisaka: Projection optical system and an exposure apparatus with the projection optical system. Nikon Corporation, Oliff & Berridge, December 14, 2004: US06831731 (37 worldwide citation)

A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain cr ...


8
Hiroyuki Nagasaka, Soichi Owa, Yasugumi Nishii: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Oliff & Berridge, June 2, 2009: US07542128 (34 worldwide citation)

An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which has a supply flow p ...


9
Hiroyuki Nagasaka, Soichi Owa, Yasugumi Nishii: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Oliff & Berridge, November 18, 2008: US07453550 (34 worldwide citation)

An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid ...


10
Soichi Owa: Ultraviolet laser source. Nikon Corporation, Foley & Lardner, November 17, 1998: US05838709 (32 worldwide citation)

An ultraviolet laser source which can stably emits ultraviolet light having a sufficient output and low coherence, as a light source for an exposure unit, for a long period of time, is compact, and allows easy maintenance. The laser source is constituted by 10.times.10 laser elements, i.e., a total ...