1
Arnon Gat, Bob Bogart, Conor Patrick O&apos Carroll, Paul Janis Timans, Shuen Chun Choy, Zion Koren, Chris Francis Bragg: Heating device for heating semiconductor wafers in thermal processing chambers. Mattson Technology, Dority & Manning P A, April 6, 2004: US06717158 (31 worldwide citation)

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. The light energy sources can be placed in various configurations. In accordance with the present invent ...


2
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Mattson Technology, Dority & Manning P A, November 29, 2005: US06970644 (25 worldwide citation)

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


3
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Mattson Technology, Dority & Manning P A, September 11, 2007: US07269343 (17 worldwide citation)

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


4
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Mattson Technology, Dority & Manning P A, May 24, 2011: US07949237 (7 worldwide citation)

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


5
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardena, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Mattson Technology, Timothy A Cassidy, Dority & Manning Pa, January 29, 2004: US20040018008-A1

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


6
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating Configuration for Use in Thermal Processing Chambers. Dority & Manning Pa, December 27, 2007: US20070297775-A1

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


7
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Dority & Manning Pa, September 29, 2005: US20050213949-A1

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


8
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating Configuration For Use in Thermal Processing Chambers. September 15, 2011: US20110222840-A1

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


9
Daniel J Devine, Rudy Santo Tomas Cardema, Shuen Chun Choy, Carl J Galewski, Yao Zhi Hu, Bruce W Peuse, Hung Thanh Phan: Process and System For Varying the Exposure to a Chemical Ambient in a Process Chamber. Mattson Technology, Dority & Manning Pa, December 31, 2009: US20090325386-A1

A processing system is disclosed for conducting various processes on substrates, such as semiconductor wafers by varying the exposure to a chemical ambient. The processing system includes a processing region having an inlet and an outlet for flowing fluids through the chamber. The outlet is in commu ...