1
Shu Huan Wang: Biodegradable protein/starch-based thermoplastic composition. Natural Polymer International Corporation, Madson & Metcalf, July 13, 1999: US05922379 (94 worldwide citation)

The invention provides a biodegradable protein/starch-based thermoplastic composition. The composition is particularly useful in preparing low ratio expanded foams. Natural cellulosic fibers such as grass fiber, wood fiber, chopped straw, bagasse, etc. function as reinforcement filler. A metallic sa ...


2
Shu Huan Wang: Edible thermoplastic and nutritious pet chew. Natural Polymer International Corporation, Madson & Metcalf, September 24, 2002: US06455083 (59 worldwide citation)

The present invention relates to an edible thermoplastic made from about 30 to 50 wt. % protein comprising a mixture of plant and animal derived protein, about 20 to 50 wt. % starch about 10 to 20 wt. % water, about 1 to 10 wt. % edible fiber, and about 0.5 to 3 wt. % metallic salt hydrate. When mol ...


3
Shu Huan Wang, Cheng Wen Chen: Protein-based chewable pet toy. Natural Polymer International Corporation, Madson & Metcalf, April 30, 2002: US06379725 (44 worldwide citation)

Protein-based, edible chewable pet toys, such as artificial dog bones, and methods of preparing such chewable pet toys are disclosed. The chewable pet toys are made from protein-based thermoplastic composition containing plant and animal derived proteinic material and various additive and nutrient i ...


4
Michael Shu Huan Wang: Chemical mechanical polishing defect reduction system and method. Texas Instruments Incorporated, April 3, 2003: US20030064595-A1

According to one embodiment of the invention, a method for removing particles from a conditioner disk used in a chemical mechanical polishing system includes submersing the conditioner disk in a fluid medium and introducing a vibrational energy to the fluid medium. The fluid medium may be deionized ...


5
Michael Shu Huan Wang, George T Wallace, Troy Stanley: Chemical mechanical polishing apparatus and method to minimize slurry accumulation and scratch excursions. Jackie Garner, Texas Instruments Incorporated, May 26, 2005: US20050113006-A1

A pad cleaning device (210, 220, 250) is used in conjunction with spray rinse water to thoroughly clean a polishing pad (110) of a chemical-mechanical polishing system (100) after a wafer (120) has been polished. A sprayer or sprayer extension (210, 220, 250) is strategically positioned and securely ...