1
Shinji Tsutsui: Pattern transfer apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 19, 1988: US04720732 (28 worldwide citation)

A pattern transfer apparatus for transferring a pattern of a mask onto a wafer. The apparatus includes a wafer chuck for holding the wafer at a position whereat the pattern of the mask is transferred onto the wafer. The temperature of the wafer held by the wafer chuck is controlled to expand/contrac ...


2
Shinji Tsutsui: Mask holder and a mask conveying and holding mechanism using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, May 8, 1990: US04924258 (26 worldwide citation)

A mask holder and a mask conveying and holding mechanism using the same, effectively usable in an exposure apparatus for printing a pattern of a mask or reticle on a workpiece such as a semiconductor wafer or a plate-like member made of glass or cermaics, is disclosed. In one preferred form, the mas ...


3
Shinji Tsutsui: Method of and apparatus for adsorbingly fixing a body. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 31, 1985: US04561688 (24 worldwide citation)

A method of and an apparatus for adsorbingly fixing a body, such as a photomask (mask) or a wafer to a chuck, effect a preliminary vacuum-adsorbing step of preventing the creation of internal stress due to the temperature change between the body and the chuck before the final vacuum adsorption is ef ...


4
Shinji Tsutsui: Semiconductor exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 14, 1986: US04564284 (18 worldwide citation)

In a semiconductor exposure apparatus having chucks for holding a mask and a wafer, respectively, the holding portion of at least one of the chucks has a coefficient of linear expansion equal to or smaller than the coefficient of linear expansion of the bodies held. Particularly, the coefficient of ...


5
Shinji Tsutsui: Cassette-type container for a sheet-like member. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, September 16, 1986: US04611967 (16 worldwide citation)

A cassette-type container for a sheet-like member, includes a lower member for carrying the sheet-like member, an upper member engageable with the lower member to define a closed chamber, a guide channel formed in the upper member, for guiding rectilinear movement of the upper member when it is enga ...


6
Hitoshi Hata, Shigeru Dono, Yukihiko Kitano, Masamichi Miyaguchi, Shinji Tsutsui, Yuichi Nishibori, Toshiaki Nanno: Massage device with flexible support straps. Matsushita Electric Works, Oblon Spivak McClelland Maier & Neustadt P C, December 10, 2002: US06491652 (14 worldwide citation)

A massage device capable of applying favorable pressure stimulation owing to expansion and shrinking of air bags irrespective of thickness of portions to be massaged such as legs or arms. The massage device has supporting bodies, strap bodies made of pliable material that are attached to the support ...


7
Hiroyuki Itoh, Shinji Tsutsui, Masahide Sato: In-line processing system. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, November 30, 1999: US05993081 (12 worldwide citation)

An in-line processing system having an exposure processing unit and a coating and development processing unit is provided with a conveyance arm for transferring a workpiece between these units. The conveyance arm can access to each of these units, and these units have horizontal workpiece holding pl ...


8
Shinji Tsutsui: Projection exposure apparatus and method for controlling a stage on the basis of a value corrected by ABBE error. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 15, 1998: US05850291 (10 worldwide citation)

An exposure method and apparatus for transferring a pattern of a mask onto a substrate to be exposed, with projection through a projection optical system. The apparatus includes a stage being movable while carrying the substrate thereon, a laser interferometer for measuring a position of the stage, ...


9
Shinji Tsutsui, Isamu Shimoda: Photomask positioning device. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, April 11, 1989: US04820930 (9 worldwide citation)

A positioning device for positioning a mask having formed thereon a pattern to be transferred onto a semiconductor wafer. On the basis of a peripheral shape of the mask, the positioning device positions the mask so that a center of the mask is brought into alignment with a center of rotation of a ho ...


10
Junji Isohata, Shinji Tsutsui: Exposure apparatus including device for determining movement of an object. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, September 22, 1992: US05150152 (8 worldwide citation)

An exposure apparatus for exposing an exposure member or wafer to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the exposure member. The apparatus includes an XY stage for moving the wafer in X- and Y-directions, ...