1
Miyashita Satoru, Kiguchi Hiroshi, Shimoda Tatsuya, Kanbe Sadao: Method of producing organic el elements, organic el elements and organic el display device. Seiko Epson, November 25, 1998: EP0880303-A1 (216 worldwide citation)

A method of manufacturing an organic EL element according to the present invention comprises the steps of forming pixel electrodes (801), (802), (803) on a transparent substrate (804) and forming on the pixel electrodes by patterning luminescent layers (806), (807), (808) made of an organic compound ...


2
Shimoda Tatsuya, Inoue Satoshi, Miyazawa Wakao: Separating method, method for transferring thin film device, and liquid crystal display device manufactured by using the transferring method. Seiko Epson, August 12, 1998: EP0858110-A1 (172 worldwide citation)

A method for transferring a thin film device on a substrate onto a transfer member, includes: a step for forming a separation layer on the substrate, a step for forming a transferred layer including the thin film device on the separation layer, a step for adhering the transferred layer including the ...


3
Shimoda Tatsuya, Inoue Satoshi, Miyazawa Wakao: Exfoliating method and transferring method of thin film device. Seiko Epson, October 8, 2003: EP1351308-A1 (100 worldwide citation)

A method for transferring a thin film device on a substrate onto a transfer member, includes: a step for forming a separation layer on the substrate, a step for forming a transferred layer including the thin film device on the separation layer, a step for adhering the transferred layer including the ...


4
Kiguchi Hiroshi, Fukushima Hitoshi, Nebashi Satoshi, Shimoda Tatsuya: Pattern formation method and substrate manufacturing apparatus. Seiko Epson, July 21, 1999: EP0930641-A2 (90 worldwide citation)

Provided is a substrate manufacturing technique for forming patterns on substrates with the aid of an ink-jet systems. Relates to a substrate manufacturing apparatus for forming arbitrary patterns on a substrate 1 from a fluid 11. This apparatus comprises an ink-jet print head 2 configured to allow ...


5
Kimura Mutsumi, Shimoda Tatsuya, Kiguchi Hiroshi: Pixel circuit, display device and electronic equipment having current-driven light-emitting device. Seiko Epson, June 16, 1999: EP0923067-A1 (77 worldwide citation)

A display apparatus (100) is provided with a current driving type light-emitting device (224) and a driving device (223) for controlling a driving current flowing through the light-emitting device for each pixel. The display apparatus comprises power source units (13, 14) for supplying power for cau ...


6
Inoue Satoshi, Shimoda Tatsuya, Miyazawa Wakao: Method of transferring thin film devices. Seiko Epson, June 23, 1999: EP0924769-A1 (66 worldwide citation)

A thin film device fabrication method in which a thin film device formed on a substrate are transferred to a primary destination-of-transfer part and then the thin film device is transferred to a secondary destination-of-transfer part. A first separation layer (120) made of such a material as amorph ...


7
Shimoda Tatsuya, Inoue Satoshi, Miyazawa Wakao: Exfoliating method and transferring method of thin film device. Seiko Epson, January 17, 2007: EP1744365-A2 (56 worldwide citation)

A method for transferring a thin film device on a substrate onto a transfer member, includes: a step for forming a separation layer on the substrate, a step for forming a transferred layer including the thin film device on the separation layer, a step for adhering the transferred layer including the ...


8
Yudasaka Ichio, Shimoda Tatsuya, Seki Shunichi: Method of manufacturing thin-film transistor. Seiko Epson, July 4, 2001: EP1113502-A1 (52 worldwide citation)

All or a part of the thin films such as a silicon film, an insulation film and a conductive film constituting the thin film transistor is formed using a liquid material by a method mainly comprising the steps of: foaming a coating film by coating a substrate with the liquid material; and forming a t ...


9
Shimoda Tatsuya, Inoue Satoshi, Miyazama Wakao: Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same. Seiko Epson, February 28, 2007: EP1758169-A2 (51 worldwide citation)

A method for transferring a thin film device on a substrate onto a transfer member, includes: a step for forming a separation layer on the substrate, a step for forming a transferred layer including the thin film device on the separation layer, a step for adhering the transferred layer including the ...


10
Shimoda Tatsuya, Inoue Satoshi, Miyazawa Wakao: Exfoliating method, transferring method of thin film device, thin film integrated circuit device, and liquid crystal display device. Seiko Epson, May 10, 2006: EP1655633-A2 (51 worldwide citation)

A method for transferring a thin film device on a substrate onto a transfer member, includes: a step for forming a separation layer on the substrate, a step for forming a transferred layer including the thin film device on the separation layer, a step for adhering the transferred layer including the ...