1
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, October 14, 2008: US07436486 (113 worldwide citation)

A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate ...


2
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, December 29, 2009: US07639343 (109 worldwide citation)

An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. In addi ...


3
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, September 15, 2009: US07589821 (108 worldwide citation)

A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.


4
Shigeru Hirukawa, Issey Tanaka: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, March 17, 2009: US07505111 (102 worldwide citation)

An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. The apparat ...


5
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, November 4, 2008: US07446851 (101 worldwide citation)

In a lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substr ...


6
Nobuyuki Irie, Eiji Takane, Shigeru Hirukawa, Yoshichika Iwamoto, Ryoichi Kaneko: Alignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positions. Nikon Corporaton, Shapiro and Shapiro, June 11, 1996: US05525808 (101 worldwide citation)

A method of aligning each of a plurality of processing areas regularly aligned on a substrate according to designed alignment coordinates to a predetermined reference position in a static coordinate system for defining the moving position of the substrate is disclosed. The coordinate positions, on t ...


7
Kyoichi Suwa, Shigeru Hirukawa, Hiroki Tateno: Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision. Nikon Corporation, Shapiro and Shapiro, March 13, 1990: US04908656 (89 worldwide citation)

An exposure method for use in an apparatus for projecting a pattern formed on a mask onto a photosensitive substrate through a projection optical system, comprises the steps of providing a mask bearing a pattern of which width gradually varies in a reference direction on the mask transferring the pa ...


8
Shigeru Hirukawa, Nobutaka Magome, Kyoichi Suwa: Distortion inspecting method for projection optical system. Nikon Corporation, Shapiro and Shapiro, March 28, 1995: US05402224 (83 worldwide citation)

A method for inspecting distortion characteristics of a projection optical system to be inspected by arranging a mask formed with measurement patterns at a plurality of predetermined positions on the object surface side of the projection optical system, transferring projected images of the plurality ...


9
Nobuyuki Irie, Nobutaka Magome, Yasuaki Tanaka, Naomasa Shiraishi, Shigeru Hirukawa: Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns. Nikon Corporation, Oliff & Berridge, September 12, 2000: US06118516 (68 worldwide citation)

A projection exposure apparatus which can perform superior observation or projection of a selected mark when the mark is observed or projected through a projection optical system in which a pupil filter is set. The projection exposure apparatus which projects a pattern on a mask through a projection ...


10
Kyoichi Suwa, Kazuo Ushida, Takeshi Suto, Masaomi Kameyama, Shigeru Hirukawa, Shinichi Nakamura: Projection exposure apparatus. Nikon Corporation, Shapiro and Shapiro, June 5, 1990: US04931830 (64 worldwide citation)

A projection exposure apparatus is provided with an illuminating optical system for illuminating a reticle having a predetermined fine pattern, a projection optical system for projecting the pattern of the reticle onto a wafer, and diaphragm means so constructed as to vary the aperture of a diaphrag ...