1
Masahiro Yamazaki, Shigeru Iizuka, Shigemitsu Kamiya, Yoshiro Oka, Katsuhiro Fujino: Method and apparatus for feeding drug liquid from hermetic returnable can. Nippon Zeon, Fujitsu, Weingarten Schurgin Gagnebin & Hayes, June 30, 1987: US04676404 (50 worldwide citation)

An apparatus for feeding a variety of doping liquid used in doping-liquid treatment processes for electronic materials such as semiconductors and precision machinery components, and a feeding monitor apparatus. More specifically, it relates to an apparatus for stably feeding the doping liquid while ...


2
Hideaki Kataoka, Eiko Yuda, Shigemitsu Kamiya, Masahide Yamamoto, Yoshikatsu Ishizuki, Yasuhiro Yoneda, Daisuke Mizutani, Kishio Yokouchi: Composition of epoxy group-containing cycloolefin resin. Nippon Zeon, Fujitsu, McDermott Will & Emery, December 14, 1999: US06001488 (30 worldwide citation)

A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and ...


3
Masaki Satoh, Shigemitsu Kamiya, Nobuo Fujie, Shuji Tabuchi: Process for production of electronic devices utilizing novolak resin as protective material. Nippon Zeon, Fujitsu, Armstrong Nikaido Marmelstein Kubovcik & Murray, January 2, 1990: US04891334 (20 worldwide citation)

A protective material for electronic parts comprises monoalkylated phenol.formaldehyde novolak resin having 6 to 12 carbon atoms in the alkyl group, and a process for the production of electronic parts, which comprises the following steps A to C:


4
Hideaki Kataoka, Eiko Yuda, Shigemitsu Kamiya, Masahide Yamamoto, Yoshikatsu Ishizuki, Yasuhiro Yoneda, Daisuke Mizutani, Kishio Yokouchi: Composition of epoxy group-containing cycloolefin resin. Nipon Zeon, Fujitsu, McDermott Will & Emery, July 21, 1998: US05783639 (11 worldwide citation)

A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and ...


5
Mikio Yajima, Shigemitsu Kamiya, Shoji Kawata: Positive-working quinone diazide photoresist composition containing a dye. Nippon Zeon, Wenderoth Lind & Ponack, August 27, 1991: US05043243 (10 worldwide citation)

A positive type photoresist composition comprising at least one alkali-soluble resin, at least one quinone diazide compound and a compound of the general formula (I) ##STR1## wherein R.sub.1 and R.sub.2 represents alkyl groups having 1 to 8 carbon atoms or a cycloalkyl group having 1 to 8 carbon ato ...


6
Hideaki Kataoka, Eiko Yuda, Shigemitsu Kamiya, Masahide Yamamoto, Yoshikatsu Ishizuki, Yasuhiro Yoneda, Daisuke Mizutani, Kishio Yokouchi: Composition of epoxy group-containing cycloolefin resin. Nippon Zeon, Fujitsu, McDermott Will & Emery, April 20, 1999: US05895800 (9 worldwide citation)

A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and ...


7
Shigemitsu Kamiya: Resin composition. Nippon Zeon, Sherman & Shalloway, December 6, 1977: US04061693 (1 worldwide citation)

An acrylonitrile resin composition capable of affording shaped articles having superior alcohol resistance, impact strength, transparency and gas-impermeability, said composition consisting essentially of (A) a resinous copolymer obtained by polymerizing a monomeric mixture consisting of (1) 60 to 9 ...