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Shibazaki Yuichi: (Ja) ステージ駆動方法及びステージ装置、露光装置、並びにデバイス製造方法, (En) Stage drive method and stage drive apparatus, exposure apparatus, and device producing method. Nikon Corporation, Shibazaki Yuichi, TATEISHI Atsuji, August 11, 2005: WO/2005/074014 (123 worldwide citation)

(EN) When a stage state is changed from a first state where one stage (WST1 (or WST2)) is positioned at a first region directly under a projection optical system (PL), to which liquid (Lq) is supplied, to a second state where the other stage (WST2 (or WST1)) is positioned at the first region, both s ...


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Shibazaki Yuichi: Stage drive method and stage drive apparatus, exposure apparatus, and device producing method. Nippon Kogaku, October 18, 2006: EP1713113-A1 (109 worldwide citation)

When a transition from a first state where one stage (WST1 (or WST2)) is positioned at a first area directly below projection optical system (PL) to which liquid (Lq) is supplied to a state where the other stage (WST2 (or WST1)) is positioned at the first area, both stages are simultaneously driven ...


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Fujiwara Tomoharu, Shibazaki Yuichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device producing method. Nikon Corporation, Fujiwara Tomoharu, Shibazaki Yuichi, SHIGA Masatake, May 11, 2006: WO/2006/049134 (63 worldwide citation)

(EN) An exposure apparatus where liquid is suppressed from remaining in it. The exposure apparatus (EX) has a substrate stage (ST1) capable of moving a substrate (P) while holding it, a measuring stage (ST2) capable of moving independent of the substrate stage (ST1), and a liquid immersion mechanism ...


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Shibazaki Yuichi: (Ja) ステージ装置及び露光装置, (En) Stage apparatus and exposure apparatus. Nikon Corporation, Shibazaki Yuichi, SHIGA Masatake, February 15, 2007: WO/2007/018127 (61 worldwide citation)

(EN) A wafer stage (WST) and a measurement stage (MST) are movable along the upper surface of a base plate (21), and delivery and reception of water (Lq) is performed when the stages are moved together in Y direction while being close to each other. An alignment system (45) measures edges, which com ...


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Shibazaki Yuichi: (Ja) ステージ装置、固定方法、露光装置、露光方法、及びデバイスの製造方法, (En) Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method. Nikon Corporation, Shibazaki Yuichi, SHIGA Masatake, December 16, 2004: WO/2004/109780 (60 worldwide citation)

(EN) A stage apparatus has a movement member movable with a plate-like body placed on a placement surface. The stage apparatus has a fixing device for fixing the plate-like body on the placement surface, and the fixing device fixes the plate-like body in conjunction with passage of the movement memb ...


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Shibazaki Yuichi: (Ja) ステージ駆動方法及びステージ装置並びに露光装置, (En) Stage drive method, stage apparatus, and exposure apparatus. Nikon Corporation, Shibazaki Yuichi, SHIGA Masatake, May 26, 2005: WO/2005/048325 (60 worldwide citation)

(EN) A stage drive method for driving a stage on the surface of a surface plate, along a guide section extending in a first direction. The method includes a step of rotating the guide section about an axis perpendicular to the surface according to a thrust occurring when the stage is driven in the f ...


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Mizutani Takeyuki, Shibazaki Yuichi, Shibuta Makoto: (Ja) 基板保持装置、露光装置、露光方法、及びデバイス製造方法, (En) Substrate holding device, exposure device, exposure method, and device fabrication method. Nikon Corporation, Mizutani Takeyuki, Shibazaki Yuichi, Shibuta Makoto, SHIGA Masatake, June 14, 2007: WO/2007/066758 (60 worldwide citation)

(EN) A substrate holding device includes: a base; a support unit (81) formed on the base to support the rear surface of a substrate (P); a first wall (31) formed on the base, having a first upper surface opposing to the rear surface of the substrate (P) supported by the support unit (81), and surrou ...


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Shibazaki Yuichi: (Ja) 基板ホルダ及びステージ装置並びに露光装置, (En) Substrate holder, stage apparatus, and exposure apparatus. Nikon Corporation, Shibazaki Yuichi, SHIGA Masatake, March 9, 2006: WO/2006/025341 (59 worldwide citation)

(EN) A substrate holder holds a substrate in excellent flatness even at the peripheral edge section, surrounding suction space, of the holder. The substrate holder has a peripheral edge section (33) surrounding suction space (38) and a first support section (34) provided in the suction space (38) an ...


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Shibazaki Yuichi: (Ja) 移動体駆動方法及び移動体駆動システム、パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法, (En) Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method. Nikon Corporation, Shibazaki Yuichi, TATEISHI Atsuji, July 26, 2007: WO/2007/083758 (36 worldwide citation)

(EN) Y-direction position information on a moving body (RST) is measured by using a interferometer (16y) and encoders ((24A, 26A1), (24B, 26B1) having an excellent short-period stability as compared to the interferometer. According to the measurement result, a predetermined calibration operation is ...


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Shibazaki Yuichi, Mizutani Takeyuki, Ichinose Go, Shibuta Makoto: (Ja) メンテナンス方法、露光方法及び装置、並びにデバイス製造方法, (En) Maintenance method, exposure method and apparatus, and device manufacturing method. Nikon Corporation, Shibazaki Yuichi, Mizutani Takeyuki, Ichinose Go, Shibuta Makoto, KAWAKITA Kijuro, November 29, 2007: WO/2007/136089 (33 worldwide citation)

(EN) A maintenance method for performing maintenance of an exposure apparatus comprising a liquid-immersion space defining member (30) for defining a liquid-immersion region by supplying liquid (1) in the space between an optical member (2) and a substrate (P), a liquid supply mechanism (10) for sup ...