1
Ravi Laxman
Chongying Xu, Thomas H Baum, Alexander S Borovik, Ziyun Wang, James T Y Lin, Scott Battle, Ravi K Laxman: Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films. Advanced Technology Materials, Steven J Hultquist, Intellectual Property Technology Law, Margaret Chappuis, September 19, 2006: US07108771 (11 worldwide citation)

A process for reducing the level(s) of water and/or other impurities from cyclosiloxanes by either azeotropic distillation, or by contacting the cyclosiloxane compositions with an adsorbent bed material. The purified cyclosiloxane material is useful for forming low-dielectric constant thin films hav ...


2
Ravi Laxman
Chongying Xu, Thomas H Baum, Alexander S Borovik, Ziyun Wang, James TY Lin, Scott Battle, Ravi K Laxman: Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films. Intellectual Property Technology Law, June 26, 2003: US20030116421-A1 (1 worldwide citation)

A process for reducing the level(s) of water and/or other impurities from cyclosiloxanes by either azeotropic distillation, or by contacting the cyclosiloxane compositions with an adsorbent bed material. The purified cyclosiloxane material is useful for forming low-dielectric constant thin films hav ...


3
Ravi Laxman
Chongying Xu, Thomas H Baum, Alexander S Borovik, Ziyun Wang, James TY Lin, Scott Battle, Ravi K Laxman: Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films. Intellectual Property Technology Law, October 19, 2006: US20060235182-A1

A process for reducing the level(s) of water and/or other impurities from cyclosiloxanes by either azeotropic distillation, or by contacting the cyclosiloxane compositions with an adsorbent bed material. The purified cyclosiloxane material is useful for forming low-dielectric constant thin films hav ...


4
John Gregg, Scott Battle, Jeffrey I Banton, Donn Naito, Marianne Fuierer: Vaporizer delivery ampoule. Advanced Technology Materials, Marianne Fuierer, Margaret Chappuis, Tristan A Fuierer, July 26, 2005: US06921062 (99 worldwide citation)

A vaporizer delivery system for use in semiconductor manufacturing processes including a plurality of vertically stacked containers for holding a vaporizable source material. Each of the vertically stacked containers includes a plurality of vented protuberances extending into the interior of the eac ...


5
Chongying Xu, Jeffrey F Roeder, Thomas H Baum, Steven M Bilodeau, Scott Battle, William Hunks, Tianniu Chen: Super-dry reagent compositions for formation of ultra low k films. Advanced Technology Materials, Steven J Hultquist, Hultquist IP, Maggie Chappuis, November 8, 2011: US08053375

An ultra low k dielectric film, including a silicon film containing porosity deriving from a porogen, as formed from a precursor silane and a porogen, wherein the precursor silane has a water content below 10 ppm, based on total weight of the precursor silane, and/or the porogen has a water content ...


6
John Gregg, Scott Battle, Jeffrey I Banton, Donn Naito, Marianne Fuierer: Vaporizer delivery ampoule. Atmi, January 29, 2004: US20040016404-A1

A vaporizer delivery system for use in semiconductor manufacturing processes including a plurality of vertically stacked containers for holding a vaporizable source material. Each of the vertically stacked containers includes a plurality of vented protuberances extending into the interior of the eac ...


7
John M Cleary, Jose I Arno, Bryan C Hendrix, Donn Naito, Scott Battle, John N Gregg, Michael J Wodjenski, Chongying Xu: Solid precursor-based delivery of fluid utilizing controlled solids morphology. Advanced Technology Materials, Intellectual Property Technology Law, October 7, 2010: US20100255198-A1

Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatu ...


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John Gregg, Scott Battle, Banton Jeffrey I, Donn Naito, Laxman Ravi K: Method and apparatus to help promote contact of gas with vaporized material. Advanced Tech Materials, li binglin zhang yang, December 8, 2010: CN201010259171

The invention relates to a vaporizer for vaporizing and delivering vaporizable source materials, which has a container including at least a container wall for limiting interior; a gas inlet and a gas outlet of intermittent flow communicatively connected to the interior, wherein the gas inlet is suit ...



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