1
Tetsuo Taniguchi, Saburo Kamiya: Stage device and exposure apparatus. Nikon Corporation, Oliff & Berridge, May 24, 2005: US06897963 (223 worldwide citation)

A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is capable of measuring the position with high precision. When a movable stage moves from the position where the ...


2
Kenji Nishi, Saburo Kamiya, Naomasa Shiraishi: Projection exposure apparatus. Nikon Corporation, Shapiro and Shapiro, December 21, 1993: US05272501 (72 worldwide citation)

A projection exposure apparatus having an irradiation optical system for irradiating a pattern formed on a mask with first irradiation light, a projection optical system for imaging and projecting the image of the pattern of the mask onto a photosensitive substrate, and a mark detection device for i ...


3
Akikazu Tanimoto, Saburo Kamiya: Method of and apparatus for measuring coordinate position and positioning an object. Nikon Corporation, Shapiro and Shapiro, September 29, 1992: US05151749 (71 worldwide citation)

A method and apparatus for measuring the coordinate position of a stage on which a semiconductor wafer or the like is placed. Two .theta. interferometers are provided as measuring means for detecting local curving deviations of reflecting surfaces of two plane mirrors perpendicular to each other whi ...


4
Naomasa Shiraishi, Yuji Kudo, Saburo Kamiya: Projection exposure apparatus. Nikon Corporation, Shapiro and Shapiro, February 17, 1998: US05719704 (49 worldwide citation)

A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators eac ...


5
Saburo Kamiya: Method and apparatus for correcting linearity errors of a moving mirror and stage. Nikon Corporation, Michael N Meller, August 4, 1998: US05790253 (38 worldwide citation)

To accurately correct the deformation component of a moving mirror on a wafer stage measure the curving data of the moving mirrors prior to the installation onto the wafer stage and store the data as a function of the distance from one end of the mirror. Then, measure the discrete curving error data ...


6
Saburo Kamiya: Substrate holder. Nikon Corporation, Shapiro and Shapiro, October 8, 1996: US05563683 (32 worldwide citation)

A substrate holder is provided with two kinds of grooves (clearances) in the absorbing surface thereof. One kind of groove is made of a suitable depth so as to be able to quickly exhaust air and reduce pressure to thereby vacuum mount a substrate, and the other kind of groove is formed with a very s ...


7
Saburo Kamiya, Hideo Mizutani: Device for detecting the levelling of the surface of an object. Nikon Corporation, Shapiro and Shapiro, February 20, 1990: US04902900 (30 worldwide citation)

A device for detecting the levelling of an object disposed on a plane substantially perpendicular to the optic axis of main objective optical means and worked by a radiation beam from the main objective optical means comprises levelling detecting optical means including an irradiating optical system ...


8
Saburo Kamiya, Kazuaki Suzuki, Akikazu Tanimoto: Exposure apparatus. Nikon Corporation, Shapiro and Shapiro, August 1, 1989: US04853745 (29 worldwide citation)

An exposure apparatus for exposing to a substrate the image of the desired pattern of a mask having a mark and a desired pattern formed thereon. Light source for illuminating the mask by at least part of the laser light from the light source, a projection optical system, movable stage, position dete ...


9
Saburo Kamiya: Optical measuring apparatus having a partitioning wall for dividing gas flow in an environmental chamber. Nikon Corporation, Shapiro and Shapiro, August 27, 1996: US05550633 (24 worldwide citation)

An optical measuring apparatus includes an environmental chamber which has a blowing opening to which a temperature-controlled gas is supplied from an external device and an exhaust opening for exhausting the air outside the environmental chamber, a light-emitting unit for irradiating a light beam o ...


10
Saburo Kamiya: Projection exposure apparatus. Nikon Corporation, Michael N Meller, January 29, 1991: US04989031 (23 worldwide citation)

A projection exposure apparatus used for the purpose of forming extremely fine patterns, e.g., semiconductor integrated circuits on a wafer. The apparatus includes an illuminating optical system for irradiating a reticle with light emitted from a light source, a projection optical system for project ...