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Meijer Hendricus J M, Rozenveld Johannes Albert, Vermeer Adrianus J P M, Markvoort Jan Albert, Maaden Johan Van Der, Eijk Jan Van: Positioning device having two manipulators operating in parallel, and optical lithographic device provided with such a positioning device.. Koninkl Philips Electronics, Asm Lithography, February 3, 1993: EP0525872-A1 (10 worldwide citation)

A positioning device (59) having two transport arms (77,81) for alternately transferring plate-shaped objects from a storage position into an operational position. The transport arms are each displaceable by means of a separate manipulator (75,79), so that a quick exchange of the objects is possible ...


2
David Christopher Ockwell, Rozenveld Johannes Albert, Cuperus Minne: Dose control for optical maskless lithography. Asml Netherlands, December 18, 2008: JP2008-306186 (1 worldwide citation)

PROBLEM TO BE SOLVED: To provide a system and method for controlling dose on a substrate.SOLUTION: A lithographic apparatus comprises a patterning device, a projection system, and a controller. The patterning device is configured to pattern a beam of radiation. The radiation beam comprises a plurali ...