1
Steve Goldband, Ron van Os, Jeffrey Barth: Interactive customer support for computer programs using network connection of user machine. Aladdin Knowledge Systems, Burns Doane Swecker & Mathis L, August 13, 2002: US06434532 (103 worldwide citation)

Broad-based, systematic, individualized, interactive customer software support is provided through a two-way, voluntary automated exchange of information between a software agent installed on a customer's machine and a server machine via a wide area computer network, e.g., the Internet. Communi ...


2
Ron Van Os, Jay W Hanson, Rudolph E Burger: Scanning system and method. Scansoft, Blakely Sokoloff Taylor & Zafman, November 12, 2002: US06480304 (96 worldwide citation)

A method and apparatus for scanning a document which utilizes scanning hardware and associated software to automate the entire scanning process. The software analyzes a host computer and automatically maps user interface buttons of a scanner with application programs installed on the host computer. ...


3
Ron van Os, William J Durbin, Richard H Matthiesen, Dennis C Fenske, Eric D Ross: Plasma enhanced chemical processing reactor and method. Watkins Johnson Company, Aldo J Test, Maria S Swiatek, Flehr Hohbach Test Albritton & Herbert, August 11, 1998: US05792272 (81 worldwide citation)

A plasma enhanced chemical processing reactor and method. The reactor includes a plasma chamber including a first gas injection manifold and a source of electromagnetic energy. The plasma chamber is in communication with a process chamber which includes a wafer support and a second gas manifold. The ...


4
Lydia J Young, Richard H Matthiesen, Simon Selitser, Ron van Os: Gas injection system for semiconductor processing. Watkins Johnson Company, Flehr Hohbach Test Albritton & Herbert, December 22, 1998: US05851294 (53 worldwide citation)

A system for injecting a gaseous substance into a semiconductor processing chamber. The injection system includes at least one plenum formed in a plenum body and a plurality of nozzles associated with each plenum for injecting gaseous substances from the plenums into the chamber. A conduit structure ...


5
Ron van Os, William J Durbin, Richard H Matthiesen, Dennis C Fenske, Eric D Ross: Plasma enchanced chemical method. Watkins Johnson Company, December 14, 1999: US06001267 (31 worldwide citation)

A plasma enhanced chemical processing reactor and method. The reactor includes a plasma chamber including a first gas injection manifold and a source of electromagnetic energy. The plasma chamber is in communication with a process chamber which includes a wafer support and a second gas manifold. The ...


6
Ron van Os, William J Durbin, Richard H Matthiesen, Dennis C Fenske, Eric D Ross: Plasma enhanced chemical processing reactor. Applied Materials, Thomason Moser & Patterson, January 30, 2001: US06178918 (30 worldwide citation)

A plasma enhance chemical processing reactor and method. The reactor includes a plasma chamber and a source of electromagnetic energy. The plasma chamber is in communication with a process chamber which includes a wager support and a gas manifold. The plasma generated in the plasma chamber extends i ...


7
Ron van Os, Derek Bray: Electrodeless discharge lamp with spiral induction coil. Diablo Research Corporation, Skjerven Morrill MacPherson Franklin & Friel, September 20, 1994: US05349271 (30 worldwide citation)

An electrodeless discharge lamp includes a discharge vessel containing an ionizable vapor, a generator for providing a high frequency signal, and an induction coil adjacent the discharge vessel and connected to the generator. The induction coil is shaped in the form of a planar spiral. The spiral co ...


8
Ron van Os, Eric D Ross: Electrostatic chuck assembly. Watkins Johnson Company, Flehr Hohbach Test Albritton & Herbert, November 17, 1998: US05838528 (29 worldwide citation)

An electrostatic support system for retaining a wafer. The support system generally includes a support body having a support surface for retaining said wafer, a voltage source coupled to the support body for electrostatically coupling the wafer to the support surface, and a cooling system for coolin ...


9
Ron van Os, David Chazen: Amalgam system for electrodeless discharge lamp. Diablo Research Corporation, Arthur J Behiel, David E Steuber, Skjerven Morrill MacPherson Franklin & Friel, January 28, 1997: US05598069 (25 worldwide citation)

An amalgam system for optimizing the mercury vapor pressure of an electrodeless discharge fluorescent lamp is disclosed. A coil network induces an electric discharge in a gas mixture contained in a sealed lamp vessel. An amalgam is supported in the discharge and thermally isolated from the lamp vess ...


10
Ron van Os, William J Durbin, Richard H Matthiesen, Dennis C Fenske, Eric D Ross: Plasma enhanced chemical processing reactor and method. Applied Materials, Moser Patterson & Sheridan, April 23, 2002: US06375750 (21 worldwide citation)

An apparatus for processing a substrate comprising a processing chamber and a substrate support system comprising an electrostatic chuck having a body portion and a substrate support surface and one or more arms extending from the body portion to mount the electrostatic chuck to a side wall portion ...