1
Michel Riepen, Nicolaas Rudolf Kemper, Johannes Catharinus Hubertus Mulkens, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 24, 2013: US08614784 (8 worldwide citation)

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, o ...


2
David Bessems, Erik Henricus Egidius Catharina Eummelen, Rogier Hendrikus Magdalena Cortie, Marcus Johannes Van Der Zanden, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops, Paul Willems: Fluid handling structure, a lithographic apparatus and a device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 16, 2014: US08836912 (4 worldwide citation)

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward d ...


3
Rogier Hendrikus Magdalena Cortie, Michel Riepen, Cornelius Maria Rops: Fluid handling structure including gas supply and gas recovery openings, lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, June 30, 2015: US09069262 (2 worldwide citation)

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward d ...


4
Raymond Wilhelmus Louis Lafarre, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 2, 2014: US08902400 (2 worldwide citation)

A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise ga ...


5
Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp: Fluid handling structure, a lithographic apparatus and a device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, March 7, 2017: US09588437 (1 worldwide citation)

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward d ...


6
Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp: Fluid handling structure, a lithographic apparatus and a device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, January 12, 2016: US09235138 (1 worldwide citation)

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward d ...


7
Rogier Hendrikus Magdalena Cortie, Michel Riepen, Cornelius Maria Rops: Fluid handling structure including gas supply and gas recovery openings, a lithographic apparatus and a device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, September 13, 2016: US09442390 (1 worldwide citation)

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward d ...


8
Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Christian Wagner, Rogier Hendrikus Magdalena Cortie: Immersion lithographic apparatus and device manufacturing method with asymmetric acceleration profile of substrate table to maintain meniscus of immersion liquid. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 10, 2015: US08953141 (1 worldwide citation)

A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an accel ...


9
Rogier Hendrikus Magdalena Cortie, Paulus Martinus Maria Liebregts, Michel Riepen, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, December 19, 2017: US09846372

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a fir ...


10
Rogier Hendrikus Magdalena Cortie, Paulus Martinus Maria Liebregts, Michel Riepen, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, February 9, 2016: US09256136

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a fir ...