1
Maricela Morales
Timothy Adams, Edward Pavelchek, Roger Sinta, Manuel Docanto, Robert Blacksmith, Peter Trefonas Iii: Antireflective coating compositions. Peter F Corless, August 1, 2002: US20020102483-A1

The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom lay ...


2
James Thackeray, George W Orsula, Roger Sinta: Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units. Shiply Company, July 7, 1992: US05128232 (70 worldwide citation)

A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.


3
Roger Sinta, Richard C Hemond, David R Medeiros, Martha M Rajaratnam, James W Thackeray, Dianne Canistro: Radiation sensitive compositions comprising polymer having acid labile groups. Shipley Company, Robert L Goldberg, Peter F Corless, November 2, 1993: US05258257 (34 worldwide citation)

The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed reg ...


4
Angelo A Lamola, Gary Calabrese, Roger Sinta: Near UV photoresist. Shipley Company, Robert L Goldberg, Peter F Corless, May 18, 1993: US05212046 (22 worldwide citation)

A photoacid-generating photoresist composition sensitized with an aromatic, multi-ring, heterocylcic nitrogen containing sensitizer, preferably a ring extended phenothiazine derivative. The use of the sensitizer permits exposure of photoresists to near UV irradiation where such photoresists have her ...


5
Roger Sinta, Richard C Hemond, David R Medeiros, Martha M Rajaratnam, James W Thackeray, Dianne Canistro: Radiation sensitive compositions comprising polymer having acid labile groups. Shipley Company, Robert L Goldberg, Peter F Corless, November 8, 1994: US05362600 (19 worldwide citation)

The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed reg ...


6
James W Thackeray, George W Orsula, Mark D Denison, Roger Sinta, Sheri L Ablaza: Polymer having inert blocking groups. Shipley Company L L C, Robert L Goldberg, July 30, 1996: US05541263 (12 worldwide citation)

An alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The polymer is used for the formulation of acid hardening photoresists and the presence of the inert blocking group enables development of an ...


7
James Thackeray, George W Orsula, Roger Sinta: Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units. Shipley Company, Robert L Goldberg, May 11, 1993: US05210000 (11 worldwide citation)

A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.


8
James W Thackeray, George W Orsula, Mark D Denison, Roger Sinta, Sheri L Ablaza: Radiation sensitive composition comprising polymer having inert blocking groups. Shipley Company L L C, Robert L Goldberg, May 7, 1996: US05514520 (9 worldwide citation)

A photoresist composition consisting of an acid or base generator, a crosslinking agent activated in the presence of an acid or base and an alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The ...


9
Theodore H Fedynyshyn, Roderick K Kunz, Michael Sworin, Roger Sinta: Low abosorbing resists for 157 nm lithography. Nutter Mcclennen & Fish, October 31, 2002: US20020160297-A1 (2 worldwide citation)

The present invention provides photoresist materials for use in photolithography at wavelengths less than about 248 nm. More particularly, the photoresists of the invention are particularly suited for use in 157 nm lithography. A photoresist composition of the invention includes a polymer having at ...


10
Theodore H Fedynyshyn, Roderick R Kunz, Michael Sworin, Roger Sinta: Low abosorbing resists for 157 nm lithography. Massachusetts Institute of Technology, Thomas J Engellenner, Reza Mollaaghababa, Nutter McClennen & Fish, September 21, 2004: US06794109 (1 worldwide citation)

The present invention provides photoresist materials for use in photolithography at wavelengths less than about 248 nm. More particularly, the photoresists of the invention are particularly suited for use in 157 nm lithography. A photoresist composition of the invention includes a polymer having at ...