1
Roger Harquail French, Timothy Gierke, Mark Andrew Harmer, Anand Jagota, Steven Raymond Lustig, Rakesh H Mehta, Paula Beyer Hietpas, Bibiana Onoa: Method for providing nano-structures of uniform length. E I du Pont de Nemours and Company, September 20, 2005: US06946410 (104 worldwide citation)

This invention relates to the field of nanotechnology. Specifically the invention describes a method for cutting a multiplicity of nano-structures to uniform dimensions of length, length and width, or area, or to a specific distribution of lengths or area using various cutting techniques.


2
Roger Harquail French, Timothy Gierke, Mark Andrew Harmer, Anand Jagota, Steven Raymond Lustig, Rakesh H Mehta, Paula Beyer Hietpas, Bibiana Onoa: Method for providing nano-structures of uniform length. E I du Pont de Nemours and Company, February 14, 2006: US06998358 (54 worldwide citation)

This invention relates to the field of nanotechnology. Specifically the invention describes a method for cutting a multiplicity of nano-structures to uniform dimensions of length, length and width, or area, or to a specific distribution of lengths or area using various cutting techniques.


3
Robert Clayton Wheland, Roger Harquail French, Frank Leonard Schadt III, Frederick C Zumsteg Jr: Copolymers for photoresists and processes therefor. E I du Pont de Nemours and Company, March 29, 2005: US06872503 (46 worldwide citation)

Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid g ...


4
Peter Francis Carcia, Roger Harquail French: Attenuating embedded phase shift photomask blanks. E I du Pont de Nemours and Company, April 27, 1999: US05897977 (15 worldwide citation)

Attenuating embedded phase shift photomask blanks capable of producing a 180.degree. phase shift with an optical transmissivity of at least 0.0001 at wavelengths <400 nm comprise alternating layers, either periodic or aperiodic, of an optically transmissive material and an optically absorbing materi ...


5
Robert Clayton Wheland, Roger Harquail French, Fredrick Claus Zumsteg Jr: Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses. E I du Pont de Nemours and Company, August 3, 2004: US06770404 (14 worldwide citation)

Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 187 to 260 nanometers.


6
Robert Clayton Wheland, Roger Harquail French, Fredrick Claus Zumsteg Jr: Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses. E I du Pont de Nemours and Company, November 30, 2004: US06824930 (14 worldwide citation)

Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 140 to 186 nanometers.


7
Roger Harquail French, Robert Clayton Wheland: Polymer-liquid compositions useful in ultraviolet and vacuum ultraviolet uses. E I du Pont de Nemours and Company, October 31, 2006: US07129009 (13 worldwide citation)

This invention relates to a fluoropolymer nanocomposite comprising a fluoropolymer phase and an inorganic oxide phase dispersed throughout, said inorganic oxide phase having either no particles or particles substantially all of which have a particle size of less than about 75 nm which can be determi ...


8
Roger Harquail French, Kenneth George Sharp: Attenuating phase shift photomasks. E I du Pont de Nemours and Company, January 16, 2001: US06174631 (12 worldwide citation)

Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a ...


9
Roger Harquail French, Kenneth George Sharp: Attenuating phase shift photomasks. E I du Pont de Nemours and Company, August 1, 2000: US06096460 (11 worldwide citation)

Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a ...


10
Peter Francis Carcia, Roger Harquail French: Attenuating embedded phase shift photomask blanks. E I du Pont de Nemours and Company, April 27, 1999: US05897976 (6 worldwide citation)

Attenuating embedded phase shift photomask blanks capable of producing a phase shift of 180.degree. and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths <400 nm comprise at least one layer of an aluminum compound and at least one component that is more opticall ...



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