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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 7, 2008: US07433016 (11 worldwide citation)

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.


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Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 23, 2008: US07468779 (7 worldwide citation)

A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liq ...


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Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 19, 2011: US07929112 (5 worldwide citation)

A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liq ...


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Bob Streefkerk, Roelof Frederik De Graaf, Johannes Catharinus Hubertus Mulkens, Marcel Beckers, Paul Petrus Joannes Berkvens, David Lucien Anstotz: Methods relating to immersion lithography and an immersion lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 19, 2013: US08587762 (5 worldwide citation)

A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedia ...


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Martinus Cornelis Maria Verhagen, Roelof Frederik De Graaf, Johannes Henricus Wilhelmus Jacobs, Franciscus Johannes Herman Maria Teunissen, Jurgen Benischek: Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 23, 2008: US07428038 (4 worldwide citation)

A lithographic apparatus is disclosed that has a semi-permeable membrane, a liquid inlet adapted to supply liquid to a first side of the membrane, and a gas inlet adapted to supply to a second side of the membrane either: (a) a vapor of the liquid, or (b) a gas which dissociates when dissolved in th ...


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Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 13, 2015: US08934082 (3 worldwide citation)

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of ...