1
Katherina Babich
Marie Angelopoulos, Katherina Babich, S Jay Chey, Michael Straight Hibbs, Robert N Lang, Arpan Pravin Mahorowala, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. International Business Machines Corporation, Daniel P Morris Esq, Scully Scott Murphy & Presser, January 27, 2004: US06682860 (4 worldwide citation)

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of ...


2
Katherina Babich
Marie Angelopoulos, Katherina Babich, S Jay Chey, Michael Straight Hibbs, Robert N Lang, Arpan Pravin Mahorowala, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. International Business Machines Corporation, Daniel P Morris Esq, Scully Scott Murphy & Presser, May 4, 2004: US06730445 (4 worldwide citation)

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of ...


3
Katherina Babich
Marie Angelopoulos, Katherina Babich, S Jay Chey, Michael Straight Hibbs, Robert N Lang, Arpan Pravin Mahorowala, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. International Business Machines Corporation, Scully Scott Murphy & Presser, Daniel P Morris Esq, December 27, 2005: US06979518

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of ...


4
Katherina Babich
Marie Angelopoulos, Katherina Babich, S Jay Chey, Michael Straight Hibbs, Robert N Lang, Arpan Pravin Mahorowala, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. International Business Machines Corporation, Ibm Corporation, Intellectual Property Law Dept, October 16, 2003: US20030194568-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of ...


5
Katherina Babich
Marie Angelopoulos, Katherina Babich, S Jay Chey, Michael Straight Hibbs, Robert N Lang, Arpan Pravin Mahorowala, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. International Business Machines Corporation, Scully Scott Murphy & Presser PC, September 2, 2004: US20040170907-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of ...


6
Katherina Babich
Marie Angelopoulos, Katherina Babich, S Jay Chey, Michael Straight Hibbs, Robert N Lang, Arpan Pravin Mahorowala, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. Dr Daniel P Morris Esq, IBM Corporation, October 16, 2003: US20030194569-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of ...


7
Marie Angelopoulos, Ari Aviram, C Richard Guarnieri, Wu Song Huang, Ranee Kwong, Robert N Lang, Arpan P Mahorowala, David R Medeiros, Wayne M Moreau: Mask-making using resist having SIO bond-containing polymer. International Business Machines Corporation, Steven Capella, July 16, 2002: US06420084 (38 worldwide citation)

The invention provides improved resist compositions and lithographic methods using the resist compositions of the invention. The resist compositions of the invention are acid-catalyzed resists which are characterized by the presence of an SiO-containing polymer. The invention also encompasses method ...


8
Willard E Conley, Ranee W Kwong, Richard J Kvitek, Robert N Lang, Christopher F Lyons, Steve S Miura, Wayne M Moreau, Harbans S Sachdev, Robert L Wood: Top coat for acid catalyzed resists. International Business Machines Corporation, Dale M Crockatt, August 31, 1993: US05240812 (18 worldwide citation)

A protective material for use as an overcoating film for acid catalyzed resist compositions comprising a polymeric film forming compound, the films of which are impermeable to vapors of organic and inorganic bases.


9
Krishna G Sachdev, Premlatha Jagannathan, Robert N Lang, Harbans S Sachdev, Ratnam Sooriyakumaran, Joel R Whitaker: Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane. International Business Machines Corporation, Dale M Crockatt, March 21, 1995: US05399462 (14 worldwide citation)

A method is provided for forming a microlithographic relief image having a width of less than one half micron in a bilayer resist composition. The resist composition comprises a single component, silicon-containing photoimageable layer and a polymeric underlayer having a high optical density and a r ...


10
Krishna G Sachdev, John P Hummel, Ranee W Kwong, Robert N Lang, Leo L Linehan, Harbans S Sachdev: Viscosity stable, essentially gel-free polyamic acid compositions. John A Stemwedel, May 19, 1992: US05115090 (12 worldwide citation)

Viscosity stable, essentially gel-free linear polyamic acids are provided by a process utilizing offset stoichiometry. Polyimides formed from such polyamic acids have low TCE and low dielectric constants.



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