1
Robert J Markunas, John B Posthill, Robert C Hendry, Raymond Thomas: Plasma furnace disposal of hazardous wastes. Research Triangle Institute, Oblon Spivak McClelland Maier & Neustadt P C, April 22, 2003: US06552295 (30 worldwide citation)

A method and apparatus for plasma waste disposal of hazardous waste material, where the hazardous material is volatilized under vacuum inside a containment chamber to produce a pre-processed gas as input to a plasma furnace including a plasma-forming region in which a plasma-forming magnetic field i ...


2
Ronald A Rudder, George C Hudson, Robert C Hendry, Robert J Markunas: Chemical vapor deposition of diamond films using water-based plasma discharges. Research Triangle Institute, Oblon Spivak McClelland Maier & Neustadt, May 23, 1995: US05418018 (10 worldwide citation)

A chemical vapor deposition (CVD) technique (process and apparatus) for the growth of diamond films using vapor mixtures of selected compounds having desired moieties, specifically precursors that provide carbon and etchant species that remove graphite disclosed. The selected compounds are reacted i ...


3
Anthony E Robson, Ronald A Rudder, Robert C Hendry, Moses M David, James V Burt: Durable plasma treatment apparatus and method. Research Triangle Institute, Oblon Spivak McClelland Maier & Neustadt P C, August 22, 2000: US06105518 (4 worldwide citation)

A method and apparatus for treating a work surface, wherein there is provided a chamber having a longitudinal axis and longitudinally extending electrically conductive sidewalls, at least one sidewall having at least one longitudinally extending gap that interrupts a current path through the sidewal ...


4
Ronald A Rudder, George C Hudson, Robert C Hendry, Robert J Markunas, Michael J Mantini: Process and apparatus for chemical vapor deposition of diamond films using water-based plasma discharges. Research Triangle Institute, Oblon Spivak McClelland Maier & Neustadt, January 2, 1996: US05480686 (4 worldwide citation)

A chemical vapor deposition (CVD) process and apparatus for the growth of diamond films using vapor mixtures of selected compounds having desired moieties, specifically precursors that provide carbon and etchant species that remove graphite. The process involves two steps. In the first step, feedsto ...


5
Robert J Markunas, Gaius G Fountain, Robert C Hendry: Plasma processing system and method. Research Triangle Institute, Oblon Spivak McClelland Maier & Neustadt P C, May 6, 2003: US06558504 (4 worldwide citation)

A plasma processing system and method wherein a power source produces a magnetic field and an electric field, and a window disposed between the power source and an interior of a plasma chamber couples the magnetic field into the plasma chamber thereby to couple power inductively into the chamber and ...


6
Anthony E Robson, Ronald A Rudder, Robert C Hendry, Moses M David, James V Burt: Durable plasma treatment apparatus and method. Berkeley Scholars, Research Triangle Institute, Minnesota Mining and Manufacturing Company, Oblon Spivak McClelland Maier & Neustadt P C, February 23, 1999: US05874014 (3 worldwide citation)

A method and apparatus for treating a work surface, wherein there is provided a chamber having a longitudinal axis and longitudinally extending electrically conductive sidewalls, at least one sidewall having at least one longitudinally extending gap that interrupts a current path through the sidewal ...


7
Robert J Markunas, Gaius G Fountain, Robert C Hendry: Plasma processing system and method. Research Triangle Institute, Oblon Spivak McClelland Maier & Neustadt P C, September 26, 2006: US07112536 (3 worldwide citation)

A plasma processing system and method wherein a power source produces a magnetic field and an electric field, and a window disposed between the power source and an interior of a plasma chamber couples the magnetic field into the plasma chamber thereby to couple power inductively into the chamber and ...


8
Robert J Markunas, Gaius G Fountain, Robert C Hendry: Plasama processing system and method. Research Triangle Insitute, Oblon Spivak Mcclelland Maier & Neustadt PC, June 12, 2003: US20030106641-A1

A plasma processing system and method wherein a power source produces a magnetic field and an electric field, and a window disposed between the power source and an interior of a plasma chamber couples the magnetic field into the plasma chamber thereby to couple power inductively into the chamber and ...


9
Robert J Markunas, John B Posthill, Robert C Hendry, Raymond Thomas: Plasma furnace disposal of hazardous wastes. Research Triangle Institute, Oblon Spivak Mcclelland Maier & Neustadt PC, April 11, 2002: US20020040889-A1

A method and apparatus for plasma waste disposal of hazardous waste material, where the hazardous material is volatilized under vacuum inside a containment chamber to produce a pre-processed gas as input to a plasma furnace including a plasma-forming region in which a plasma-forming magnetic field i ...