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Lof Joeri, Derksen Antonius Theodorus Ann, Hoogendam Christiaan Alexander, Kolesnychenko Aleksey, Loopstra Erik Roelof, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hu, Ritsema Roelof Aeilko Siebrand, Simon Klaus, de Smit Joannes Theodoor, Straaijer Alexander, Streefkerk Bob, Van Santen Helmar: Immersion lithographic apparatus and device manufacturing method. Asml Netherlands, May 19, 2004: EP1420298-A2 (368 worldwide citation)

In a lithographic projection apparatus a seal member (12) surrounds a space between the final element of a projection system and a substrate table of the lithographic projection apparatus. A gas seal (16) is formed between said seal member and the surface of said substrate to contain liquid (11) in ...


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Lof Joeri, de Smit Joannes Theodor, Ritsema Roelof Aeilko Siebrand, Simon Klaus, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hu, Meijer Hendricus Johannes Mari, Loopstra Erik Roelof: Lithographic apparatus and device manufacturing method. Asml Netherlands, May 19, 2004: EP1420300-A2 (360 worldwide citation)

A map of the surface of a substrate is generated at a measurement station (30). The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid (10). The substrate is then aligned using, for example, a transmission image sensor and, using the previous ...


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Lof Joeri, Bijlaart Erik Theodorus Maria, Butler Hans, Donders Sjoerd Nicolaas Lamber, Hoogendam Christiaan Alexander, Kolesnychenko Aleksey, Loopstra Erik Roelof, Meijer Hendricus Johannes Mari, Mertens Jeroen Johannes Sophia, Mulkens Johannes Catharinus Hu, Ritsema Roelof Aeilko Siebrand, Van Schaik Frank, Sengers Timotheus Franciscus, Simon Klaus, de Smit Joannes Theodoor, Straaijer Alexander, Streefkerk Bob, Van Santen Helmar: Lithographic apparatus and device manufacturing method. Asml Netherlands, June 16, 2004: EP1429188-A2 (141 worldwide citation)

A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and the substrate is filled with a liquid. An edge seal member 17, 117 at least partly surrounds the substrate W or other object on the substrate table WT to prevent catastrophic li ...


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Lof Joeri, Antonius Theodorus Anna Maria Derksen, Hoogendam Christiaan Alexander, Kolesnychenko Aleksey, Loopstra Erik Roelof, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hubertus, Ritsema Roelof Aeilko Siebrand, Simon Klaus, de Smit Johannes Theodoor, Straaijer Alexander, Streefkerk Bob, Van Santen Helmar: Lithography system and process for fabricating device. Asml Netherlands, October 14, 2004: JP2004-289126 (94 worldwide citation)

PROBLEM TO BE SOLVED: To provide a lithography projector in which a space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation.SOLUTION: In the lithography projector, the space between the fi ...


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Lof Joeri, de Smit Joannes Theodoor, Ritsema Roelof Aeilko Siebrand, Simon Klaus, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hubertus, Meijer Hendricus Johannes Maria, Loopstra Erik Roelof: Lithographic apparatus and device manufacturing method. Asml Netherlands, June 10, 2004: JP2004-165666 (59 worldwide citation)

PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate W is moved to the place of which space between a proj ...


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Lof Joeri, Antonius Theodorus Anna Maria Derksen, Hoogendam Christiaan Alexander, Kolesnychenko Aleksey, Loopstra Erik Roelof, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hubertus, Ritsema Roelof Aeilko Siebrand, Simon Klaus, de Smit Johannes Theodoor, Straaijer Alexander, Streefkerk Bob, Van Santen Helmar: Lithographic projection apparatus. Asml Netherlands, June 7, 2007: JP2007-142460 (20 worldwide citation)

PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which a space between the substrate and projection system is filled with a liquid while minimizing the volume of the liquid that must be accelerated during stage movements.SOLUTION: In the lithographic projection apparatus, a se ...


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Lof Joeri, Bijlaart Erik Theodorus Maria, Butler Hans, Donders Sjoerd Nicolaas Lambertus, Hoogendam Christiaan Alexander, Kolesnychenko Aleksey, Loopstra Erik Roelof, Meijer Hendricus Johannes Maria, Mertens Jeroen Johannes Sophia M, Mulkens Johannes Catharinus Hubertus, Ritsema Roelof Aeilko Siebrand, Schaik Frank Van, Sengers Timotheus Franciscus, Simon Klaus, de Smit Johannes Theodoor, Straaijer Alexander, Streefkerk Bob, Van Santen Helmar: Lithographic projection apparatus. Asml Netherlands, August 16, 2007: JP2007-208279 (2 worldwide citation)

PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure.SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrat ...


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