1
Salvador Duenas, Ratnaji Rao Kola, Henry Y Kumagai, Maureen Yee Lau, Paul A Sullivan, King Lien Tai: Thin film capacitors and process for making them. Lucent Technologies, Richard J Botos, June 13, 2000: US06075691 (62 worldwide citation)

A thin film capacitor for use in semiconductor integrated circuit devices such as analog circuits, rf circuits, and dynamic random access memories (DRAMs), and a method for its fabrication, is disclosed. The capacitor has a dielectric thickness less than about 50 nm, a capacitance density of at leas ...


2
Ratnaji Rao Kola, Louis Thomas Manzione, Roderick Kent Watts: Embedded thin film passive components. Agere Systems Guardian, Peter V D Wilde, November 20, 2001: US06317948 (46 worldwide citation)

The specification describes of multilevel printed circuit boards and a process for their manufacture in which capacitors and other passive components are buried between levels of the multilevel board. The capacitor in the multilevel structure is designed so that access is conveniently provided to co ...


3
Ratnaji Rao Kola, King Lien Tai: Thin film tantalum oxide capacitors and resulting product. Lucent Technologies, Mathews Collins Shepherd & Gould P A, August 10, 1999: US05936831 (22 worldwide citation)

In accordance with the invention, a thin film capacitor including a dielectric of nitrogen or silicon-doped tantalum oxide and at least one electrode including chromium. Preferably the capacitor is fabricated by anodically oxidizing TaN.sub.x or Ta.sub.2 Si and forming a Cr counterelectrode. The met ...