1
Andrew Perry, Randall Mundt: Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source. Lam Research Corporation, Hickman Stephens Coleman & Hughes, December 12, 2000: US06160621 (51 worldwide citation)

An interferometric method and apparatus for in-situ monitoring of a thin film thickness and of etch and deposition rates using a pulsed flash lamp providing a high instantaneous power pulse and having a wide spectral width. The optical path between the flash lamp and a spectrograph used for detectin ...


2
Andrew Perry, Randall Mundt: Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source. LAM Research Corporation, Locke Liddell & Sapp, June 27, 2006: USRE039145

An interferometric method and apparatus for in-situ monitoring of a thin film thickness and of etch and deposition rates using a pulsed flash lamp providing a high instantaneous power pulse and having a wide spectral width. The optical path between the flash lamp and a spectrograph used for detectin ...