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Michel Riepen, Nicolaas Rudolf Kemper, Johannes Catharinus Hubertus Mulkens, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 24, 2013: US08614784 (8 worldwide citation)

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, o ...


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Raymond Wilhelmus Louis Lafarre, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 2, 2014: US08902400 (2 worldwide citation)

A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise ga ...


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Harry Sewell, Erik Theodorus Maria Bijlaart, Sjoerd Nicolaas Lambertus Donders, Louis John Markoya, Diane McCafferty, Ralph Joseph Meijers: Re-flow and buffer system for immersion lithography. ASML Netherlands, ASML Holding, Pillsbury Winthrop Shaw Pittman, May 28, 2013: US08451422

A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transduc ...


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Harry Sewell, Erik Theodorus Maria Bijlaart, Sjoerd Nicolaas Lambertus Donders, Louis John Markoya, Diane McCafferty, Ralph Joseph Meijers: Re-flow and buffer system for immersion lithography. Asml Netherlands, ASML Holding, Pillsbury Winthrop Shaw Pittman, August 27, 2009: US20090213343-A1

A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transduc ...


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Raymond Wilhelmus Louis LAFARRE, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus. Asml Netherlands, September 8, 2011: US20110216292-A1

A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise ga ...


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Michel RIEPEN, Nicolaas Rudolf Kemper, Johannes Catharinus Hubertus Mulkens, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method. Asml Netherlands, April 21, 2011: US20110090472-A1

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, o ...


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Harry Sewell, Sjoerd Nicolaas lambertus Donders, Louis John Markoya, Diane McCafferty, Ralph Joseph Meijers: Fluid handling device, an immersion lithographic apparatus and a device manufacturing method. ASML Holding, ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 26, 2010: US20100214544-A1

A fluid handling device for an immersion lithographic apparatus, the fluid handling device comprising: at least one body with a surface facing a space for fluid; a plurality of openings for the flow of fluid therethrough defined in the surface; at least one barrier moveable relative to the plurality ...