1
Sharad Saxena, Amy J Unruh, Purnendu K Mozumder, Richard G Burch: Process flow design at the module effects level through the use of acceptability regions. Texas Instruments Incorporated, Bret J Petersen, Richard L Donaldson, June 15, 1999: US05912678 (115 worldwide citation)

Methods and processes to reduce the cost and cycle time of designing manufacturing flows are described, particularly for microelectronic integrated circuit processes. One embodiment of the present invention is a method which divides the task of designing process flows into a number of abstraction le ...


2
Purnendu K Mozumder, Sharad Saxena, William W Pu: Multi-variable statistical process controller for discrete manufacturing. Texas Instruments Incorporated, Ruben C DeLeon, James C Kesterson, Richard L Donaldson, April 18, 1995: US05408405 (114 worldwide citation)

A method and system for controlling a plurality of process control variables for processing discrete products is described. The method comprising: utilizing process models relating a plurality of product quality parameters to the plurality of process control variables; measuring the plurality of pro ...


3
Purnendu K Mozumder, Gabe G Barna: System and method for controlling semiconductor wafer processing. Texas Instruments, William B Kempler, Richard L Donaldson, June 11, 1996: US05526293 (113 worldwide citation)

A system (10) for run-to-run control of semiconductor wafer processing is provided. An input/output device (12) receives a desired quality characteristic for a particular semiconductor fabrication process. A generating circuit (22) uses a model to generate appropriate process parameters for a proces ...


4
Brian E Stine, Christopher Hess, John Kibarian, Kimon Michaels, Joseph C Davis, Purnendu K Mozumder, Sherry F Lee, Larg H Weiland, Dennis J Ciplickas, David M Stashower: System and method for product yield prediction. PDF Solutions, Morrison & Foerster, May 31, 2005: US06901564 (98 worldwide citation)

A yield for an integrated circuit is predicted by processing a wafer to have a portion fabricated with at least one layout attribute of the integrated circuit. The portion of the wafer is analyzed to determine an actual yield associated with the at least one layout attribute. A systematic yield asso ...


5
Michael F Sullivan, Judith S Hirsch, Stephanie W Butler, Nicholas J Tovell, Jerry A Stefani, Purnendu K Mozumder, Ulrich H Wild, Chun Jen J Wang, Robert A Hartzell: Apparatus and method for model based process control. Texas Instruments Incorporated, W Daniel Swayze Jr, Leo N Heiting, Richard L Donaldson, March 28, 1995: US05402367 (75 worldwide citation)

The present invention configures a control strategy and a process model to calculate a setting of a machine. The present invention adjusts the process model in accordance with an analysis of the setting to control the machine.


6
Michael Francis Sullivan, Judith Susan Hirsch, Stephanie Watts Butler, Nicholas John Tovell, Jerry Alan Stefani, Purnendu K Mozumder, Ulrich H Wild, Chun Jen Jason Wang, Robert A Hartzell: Apparatus and method for model based process control. Texas Instruments, W Daniel Swayze Jr, W James Brady III, Richard L Donaldson, November 17, 1998: US05838595 (56 worldwide citation)

The present invention configures a control strategy and a process model to calculate a setting of a machine. The present invention adjusts the process model in accordance with an analysis of the setting to control the machine.


7
Purnendu K Mozumder, Sharad Saxena: Use of spatial models for simultaneous control of various non-uniformity metrics. Texas Instruments Incorporated, Ruben C Deleon, James C Kesterson, Richard L Donaldson, August 13, 1996: US05546312 (55 worldwide citation)

A method and system have been described for simultaneously controlling one or multiple metrics of non-uniformity using a model form independent multi-variable controller. The method comprising: utilizing process models relating a plurality of product quality parameters to the plurality of process co ...


8
Joseph C Davis, Karthik Vasanth, Sharad Saxena, Purnendu K Mozumder, Suraj Rao, Chenjing L Fernando, Richard G Burch: Method and system for using response-surface methodologies to determine optimal tuning parameters for complex simulators. Texas Instruments Incorporated, Wade James Brady III, Frederick J Telecky Jr, April 30, 2002: US06381564 (53 worldwide citation)

A method and system for providing optimal tuning for complex simulators. The method and system include initially building at least one RSM model having input and output terminals. Then there is provided a simulation-free optimization function by constructing an objective function from the outputs at ...


9
Sharad Saxena, Purnendu K Mozumder, Gregory B Shinn, Kelly J Taylor: Controlling process modules using site models and monitor wafer control. Texas Instruments Incorporated, Bret J Petersen, James C Kesterson, Richard L Donaldson, May 12, 1998: US05751582 (52 worldwide citation)

A method is described for controlling a plurality of nonuniformity parameters in processing discrete products such as semiconductor wafers through a module consisting of several individual processes using site models. The method uses a controlled process to compensate for a subsequent uncontrolled p ...


10
Sharad Saxena, Karthik Vasanth, Richard G Burch, Purnendu K Mozumder, Suraj Rao, Joseph C Davis: Design of microelectronic process flows for manufacturability and performance. Texas Instruments Incorporated, Carlton H Hoel, W James Brady, Frederick J Telecky Jr, October 30, 2001: US06311096 (21 worldwide citation)

A statistical design method is provided for minimizing the impact of manufacturing variations on semiconductor manufacturing by statistical design which seeks to reduce the impact of variability on device behavior. The method is based upon a Markov representation of a process flow which captures the ...



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