1
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, August 17, 2004: US06778257 (424 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


2
Pieter Willem Herman De Jager, Henri Gerard Cato Werij, Peter Van Zuylen: Lithographic device. ASML Netherlands, Pillsbury Winthrop, October 1, 2002: US06459472 (54 worldwide citation)

A lithographic device has a radiation system for supplying a projection beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; and a projection system for imaging an irradiated portion of the mask on ...


3
Cheng Qun Gui, Pieter Willem Herman de Jager: Lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, July 25, 2006: US07081947 (34 worldwide citation)

An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of indivi ...


4
Arie Jeffrey Den Boef, Frank Bornebroek, Hugo Augustinus Joseph Cramer, Mircea Dusa, Richard Johannes Franciscus Van Haren, Antoine Gaston Marie Kiers, Justin Lloyd Kreuzer, Maurits Van Der Schaar, Paul Jacques Van Wijnen, Everhardus Cornelis Mos, Pieter Willem Herman De Jager, Hans Van Der Laan, Paul Frank Luehrmann: Device inspection method and apparatus using an asymmetric marker. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 26, 2006: US07112813 (28 worldwide citation)

A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be inspected, directing light at the marker, obtaining a first measurement of the position of the marker via dete ...


5
Pieter Willem Herman de Jager, Pieter Kruit, Arno Jan Bleeker, Karel Diederick van der Mast: Lithographic apparatus, device manufacturing method, and device manufactured thereby. Shirley L Church, October 14, 2003: US06633366 (26 worldwide citation)

Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.


6
Pieter Willem Herman De Jager, Cheng Qun Gui, Peter Spit, Eduard Hoeberichts: Lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, January 2, 2007: US07158208 (18 worldwide citation)

A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array o ...


7
Pieter Willem Herman De Jager: Lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, May 15, 2007: US07218380 (13 worldwide citation)

Provided is an apparatus including an array of individually controllable elements and a plurality of projection systems that project respective ones of patterned beams onto a substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the ...


8
Richard Alexander George, Cheng Qun Gui, Pieter Willem Herman de Jager, Robbert Edgar Van Leeuwen, Jacobus Burghoom: Lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox, June 10, 2008: US07385675 (11 worldwide citation)

A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.


9
Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Jozef Petrus Henricus Benschop, Cheng Qun Gui, Johannes Onvlee, Erwin John Van Zwet: Lithographic apparatus, programmable patterning device and lithographic method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 10, 2013: US08531648 (10 worldwide citation)

In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulato ...


10
Pieter Willem Herman de Jager: Lithographic projection apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, February 7, 2006: US06995830 (9 worldwide citation)

A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation ...